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Description
| - Cerium oxide doped by a noble metal has been researched intensively for its high catalytic activity. In the presented study, Rh-Ce-O and CeOx thin films were deposited onto SiO2 and Cu substrates by radio-frequency magnetron sputtering. Thermal stability of the films was investigated by photoelectron spectroscopy techniques. Our results show that the substrate has a great influence on the stability of the overlayers. Rh-Ce-O deposited on Cu decomposes into rhodium and cerium oxide separate phases above 600 K. In contrary, the Rh-Ce-O film on SiO2 remains stable up to 800 K, but silicon migrates from the substrate into the film, forming cerium silicate. We suggest that a strong interaction between SiO2 substrate and Rh-Ce-O, or CeOx films, could be responsible for higher thermal stability compared to films deposited onto Cu.
- Cerium oxide doped by a noble metal has been researched intensively for its high catalytic activity. In the presented study, Rh-Ce-O and CeOx thin films were deposited onto SiO2 and Cu substrates by radio-frequency magnetron sputtering. Thermal stability of the films was investigated by photoelectron spectroscopy techniques. Our results show that the substrate has a great influence on the stability of the overlayers. Rh-Ce-O deposited on Cu decomposes into rhodium and cerium oxide separate phases above 600 K. In contrary, the Rh-Ce-O film on SiO2 remains stable up to 800 K, but silicon migrates from the substrate into the film, forming cerium silicate. We suggest that a strong interaction between SiO2 substrate and Rh-Ce-O, or CeOx films, could be responsible for higher thermal stability compared to films deposited onto Cu. (en)
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Title
| - The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films
- The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films (en)
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skos:prefLabel
| - The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films
- The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films (en)
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skos:notation
| - RIV/00216208:11320/14:10289725!RIV15-MSM-11320___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - I, P(LD13054), P(LG12003), S
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/00216208:11320/14:10289725
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - cerium silicate; thin film; mixed oxide; rhodium; ceria; photoelectron spectroscopy (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Surface and Interface Analysis
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Matolín, Vladimír
- Tsud, Nataliya
- Vorokhta, Mykhailo
- Nehasil, Václav
- Kobayashi, Keisuke
- Kobata, Masaaki
- Ševčíková, Klára
- Yoshikawa, Hideki
- Zahoranová, Tatiana
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
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http://localhost/t...ganizacniJednotka
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