About: Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser     Goto   Sponge   NotDistinct   Permalink

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  • Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1-3 eV and similar to 10(13)-10(14)m(-3), respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.
  • Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1-3 eV and similar to 10(13)-10(14)m(-3), respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target. (en)
Title
  • Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
  • Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser (en)
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  • Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
  • Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser (en)
skos:notation
  • RIV/00216208:11320/14:10285415!RIV15-MSM-11320___
http://linked.open...avai/riv/aktivita
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  • I, P(GAP108/11/1312), S
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  • 40
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  • 25616
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  • RIV/00216208:11320/14:10285415
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  • plasma plume; pulsed laser deposition; Langmuir probe; XUV laser (en)
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  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [7E595B435FC2]
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  • Journal of Physics D - Applied Physics
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http://linked.open...v/svazekPeriodika
  • 47
http://linked.open...iv/tvurceVysledku
  • Burian, Tomáš
  • Daniš, Stanislav
  • Juha, L.
  • Pira, Peter
  • Wild, Jan
  • Zelinger, Z.
  • Kudrna, Pavel
  • Tichý, Milan
  • Kolpaková, Anna
  • Lancok, J.
  • Civis, S.
  • Kubat, P.
  • Vysin, L.
http://linked.open...ain/vavai/riv/wos
  • 000341784800012
issn
  • 0022-3727
number of pages
http://bibframe.org/vocab/doi
  • 10.1088/0022-3727/47/40/405205
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  • 11320
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