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Description
| - Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1-3 eV and similar to 10(13)-10(14)m(-3), respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.
- Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1-3 eV and similar to 10(13)-10(14)m(-3), respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target. (en)
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Title
| - Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
- Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser (en)
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skos:prefLabel
| - Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
- Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser (en)
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skos:notation
| - RIV/00216208:11320/14:10285415!RIV15-MSM-11320___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/00216208:11320/14:10285415
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - plasma plume; pulsed laser deposition; Langmuir probe; XUV laser (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Journal of Physics D - Applied Physics
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Burian, Tomáš
- Daniš, Stanislav
- Juha, L.
- Pira, Peter
- Wild, Jan
- Zelinger, Z.
- Kudrna, Pavel
- Tichý, Milan
- Kolpaková, Anna
- Lancok, J.
- Civis, S.
- Kubat, P.
- Vysin, L.
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1088/0022-3727/47/40/405205
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http://localhost/t...ganizacniJednotka
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