About: Contactless resistivity and photoconductivity correlation to surface preparation of CdZnTe

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About: Contactless resistivity and photoconductivity correlation to surface preparation of CdZnTe Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.apsusc.2014.07.104
Description	We investigated the influence of lapping, polishing and chemical etching of semi-insulating CdZnTe by the contactless resistivity and photoconductivity method. This method can determine the sample parameters independent of the type and quality of the metallization. We observed that the evaluated sample resistivity varies with the surface preparation method up to a factor of two. The photoconductivity anti-correlates with resistivity and it changes strongly within one order of magnitude. We determined a correlation between surface roughness, oxide layer thickness and material resistivity. Deviation of the trends is visible with surface preparation by chemical etching. We propose an optimal surface treatment to maximize the resistivity and thus to decrease the dark current. (C) 2014 Elsevier B.V. All rights reserved. We investigated the influence of lapping, polishing and chemical etching of semi-insulating CdZnTe by the contactless resistivity and photoconductivity method. This method can determine the sample parameters independent of the type and quality of the metallization. We observed that the evaluated sample resistivity varies with the surface preparation method up to a factor of two. The photoconductivity anti-correlates with resistivity and it changes strongly within one order of magnitude. We determined a correlation between surface roughness, oxide layer thickness and material resistivity. Deviation of the trends is visible with surface preparation by chemical etching. We propose an optimal surface treatment to maximize the resistivity and thus to decrease the dark current. (C) 2014 Elsevier B.V. All rights reserved. (en)
Title	Contactless resistivity and photoconductivity correlation to surface preparation of CdZnTe Contactless resistivity and photoconductivity correlation to surface preparation of CdZnTe (en)
skos:prefLabel	Contactless resistivity and photoconductivity correlation to surface preparation of CdZnTe Contactless resistivity and photoconductivity correlation to surface preparation of CdZnTe (en)
skos:notation	RIV/00216208:11320/14:10283177!RIV15-MSM-11320___
http://linked.open...avai/riv/aktivita	I P S
http://linked.open...avai/riv/aktivity	I, P(GA13-13671S), S
http://linked.open...iv/cisloPeriodika	Neuveden
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Šedivý, Lukáš Moravec, Pavel Franc, Jan Ulrych, Jan Mašek, Karel Zázvorka, Jakub Jesenská, Eva
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	8747
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/14:10283177
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Material characterization; Surface preparation; Contactless resistivity; CdTe (en)
http://linked.open.../riv/klicoveSlovo	Contactless resistivity CdTe Material characterization Surface preparation
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[56D3B1240E1E]
http://linked.open...i/riv/nazevZdroje	Applied Surface Science
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	X-ray detectors for high photon fluxes
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	315
http://linked.open...iv/tvurceVysledku	Franc, Jan Mašek, Karel Moravec, Pavel Ulrych, Jan Zázvorka, Jakub Šedivý, Lukáš Jesenská, Eva
http://linked.open...ain/vavai/riv/wos	000342360300022
issn	0169-4332
number of pages	5 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.apsusc.2014.07.104
http://localhost/t...ganizacniJednotka	11320

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