About: Epitaxial CeO2 thin films for a mechanism study of resistive random access memory (ReRAM)     Goto   Sponge   NotDistinct   Permalink

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  • A thin epitaxial CeO2 film was grown on a Cu(111) single crystal in order to investigate the mechanism of resistive memory/switching devices with an ultimately thin high-k dielectric film. A small amount of Pt was deposited on the CeO2 film and the Pt/CeO2/Cu structure was characterized by conductive atomic force microscopy and X-ray photoelectron spectroscopy. It was found that the grown epitaxial CeO2 film was fully oxidized, i.e., the valence of Ce atoms in the film was completely Ce4+. However, after the deposition of a small amount of Pt, it was revealed that Ce atoms were partially reduced to Ce3+ in full thickness of the film. The Pt/CeO2/Cu structure did not show switching behavior in resistance. The observed reduction of CeO2 film is considered to be responsible to the non-switching behavior. The thermodynamics of the reduction of the CeO2 film and the kinetics of oxygen diffusion in the reduced CeO2 film are discussed.
  • A thin epitaxial CeO2 film was grown on a Cu(111) single crystal in order to investigate the mechanism of resistive memory/switching devices with an ultimately thin high-k dielectric film. A small amount of Pt was deposited on the CeO2 film and the Pt/CeO2/Cu structure was characterized by conductive atomic force microscopy and X-ray photoelectron spectroscopy. It was found that the grown epitaxial CeO2 film was fully oxidized, i.e., the valence of Ce atoms in the film was completely Ce4+. However, after the deposition of a small amount of Pt, it was revealed that Ce atoms were partially reduced to Ce3+ in full thickness of the film. The Pt/CeO2/Cu structure did not show switching behavior in resistance. The observed reduction of CeO2 film is considered to be responsible to the non-switching behavior. The thermodynamics of the reduction of the CeO2 film and the kinetics of oxygen diffusion in the reduced CeO2 film are discussed. (en)
Title
  • Epitaxial CeO2 thin films for a mechanism study of resistive random access memory (ReRAM)
  • Epitaxial CeO2 thin films for a mechanism study of resistive random access memory (ReRAM) (en)
skos:prefLabel
  • Epitaxial CeO2 thin films for a mechanism study of resistive random access memory (ReRAM)
  • Epitaxial CeO2 thin films for a mechanism study of resistive random access memory (ReRAM) (en)
skos:notation
  • RIV/00216208:11320/13:10192093!RIV14-MSM-11320___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • I, S
http://linked.open...iv/cisloPeriodika
  • 12
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...titaPredkladatele
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  • 73117
http://linked.open...ai/riv/idVysledku
  • RIV/00216208:11320/13:10192093
http://linked.open...riv/jazykVysledku
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  • XPS; I-V curve; Memory; ReRAM; Reduction; Ceria (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [5A1C003065F6]
http://linked.open...i/riv/nazevZdroje
  • Journal of Solid State Electrochemistry
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 17
http://linked.open...iv/tvurceVysledku
  • Matolín, Vladimír
  • Václavů, Michal
  • Chundak, Mykhailo
  • Chikyow, Toyohiro
  • Yoshitake, Michiko
http://linked.open...ain/vavai/riv/wos
  • 000327077000022
issn
  • 1432-8488
number of pages
http://bibframe.org/vocab/doi
  • 10.1007/s10008-013-2200-6
http://localhost/t...ganizacniJednotka
  • 11320
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