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| Description
| - Multilayered thin films of Ti-TiO 2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO 2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O 2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO 2 films. H charging at 1 bar and at 300 oC revealed that, in the case of the tri-layered structure of Ti/TiO 2 /Ti/Si(111), H diffused through the TiO 2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiH x phase ( x < 0.66) was formed under such a high H pressure.
- Multilayered thin films of Ti-TiO 2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO 2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O 2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO 2 films. H charging at 1 bar and at 300 oC revealed that, in the case of the tri-layered structure of Ti/TiO 2 /Ti/Si(111), H diffused through the TiO 2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiH x phase ( x < 0.66) was formed under such a high H pressure. (en)
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| Title
| - Hydrogen storage in Ti-TiO 2 multilayers
- Hydrogen storage in Ti-TiO 2 multilayers (en)
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| skos:prefLabel
| - Hydrogen storage in Ti-TiO 2 multilayers
- Hydrogen storage in Ti-TiO 2 multilayers (en)
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| skos:notation
| - RIV/00216208:11320/13:10190410!RIV14-MSM-11320___
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/00216208:11320/13:10190410
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - multilayers; Ti-TiO; storage; Hydrogen (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
| - Advances in Natural Sciences: Nanoscience and Nanotechnology
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| http://linked.open...in/vavai/riv/obor
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| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...UplatneniVysledku
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| http://linked.open...v/svazekPeriodika
| |
| http://linked.open...iv/tvurceVysledku
| - Balogh, A. G.
- Havela, Ladislav
- Kužel, Radomír
- Tarnawski, Z.
- Sechovský, Vladimír
- Nhu-Tarnawska, K.
- Brudnik, A.
- Drogowska, K.
- Zakrzewska, K.
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| issn
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| number of pages
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| http://bibframe.org/vocab/doi
| - 10.1088/2043-6262/4/2/025004
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| http://localhost/t...ganizacniJednotka
| |
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