About: A slightly oxidizing etchant for polishing of CdTe and CdZnTe surfaces

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About: A slightly oxidizing etchant for polishing of CdTe and CdZnTe surfaces Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://link.springer.com/article/10.1007/s11664-013-2625-9
Description	New iodine-evolving etching solutions were developed for surface treatment of CdTe and CdZnTe crystals. The nature of the chemical dissolution of CdTe samples with (100), (110), and (111) orientations, and also of (211) Cd0.96Zn0.04Te samples, in KIO3-KI-lactic acid solution was studied. It was established that this dissolution is diffusion controlled. Surface roughness measurements revealed highly polishing properties of the etchant. A study of the chemical composition and structure of the (211)B Cd0.96Zn0.04Te surfaces etched under different conditions was carried out. The thickness of the Te oxide layer was evaluated in the course of heating in vacuum. KIO3-KI-lactic acid treatment appears to be preferable in terms of elimination of Te oxides from the surface as compared to standard Br2-methanol solution. The etching compositions were shown to be useful for chemical polishing of CdTe-based surfaces. New iodine-evolving etching solutions were developed for surface treatment of CdTe and CdZnTe crystals. The nature of the chemical dissolution of CdTe samples with (100), (110), and (111) orientations, and also of (211) Cd0.96Zn0.04Te samples, in KIO3-KI-lactic acid solution was studied. It was established that this dissolution is diffusion controlled. Surface roughness measurements revealed highly polishing properties of the etchant. A study of the chemical composition and structure of the (211)B Cd0.96Zn0.04Te surfaces etched under different conditions was carried out. The thickness of the Te oxide layer was evaluated in the course of heating in vacuum. KIO3-KI-lactic acid treatment appears to be preferable in terms of elimination of Te oxides from the surface as compared to standard Br2-methanol solution. The etching compositions were shown to be useful for chemical polishing of CdTe-based surfaces. (en)
Title	A slightly oxidizing etchant for polishing of CdTe and CdZnTe surfaces A slightly oxidizing etchant for polishing of CdTe and CdZnTe surfaces (en)
skos:prefLabel	A slightly oxidizing etchant for polishing of CdTe and CdZnTe surfaces A slightly oxidizing etchant for polishing of CdTe and CdZnTe surfaces (en)
skos:notation	RIV/00216208:11320/13:10189652!RIV14-MSM-11320___
http://linked.open...avai/riv/aktivita	I
http://linked.open...avai/riv/aktivity	I
http://linked.open...iv/cisloPeriodika	11
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Grill, Roman Höschl, Pavel Moravec, Pavel Franc, Jan Mašek, Karel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	59075
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/13:10189652
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	RHEED; XPS; chemical polishing; chemical etching; CdZnTe; CdTe (en)
http://linked.open.../riv/klicoveSlovo	chemical polishing CdTe RHEED XPS CdZnTe chemical etching
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[016580604796]
http://linked.open...i/riv/nazevZdroje	Journal of Electronic Materials
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	42
http://linked.open...iv/tvurceVysledku	Franc, Jan Grill, Roman Höschl, Pavel Mašek, Karel Moravec, Pavel Tomashik, V. M. Tomashik, Z.F. Ivanitska, V. G.
http://linked.open...ain/vavai/riv/wos	000326046800008
issn	0361-5235
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1007/s11664-013-2625-9
http://localhost/t...ganizacniJednotka	11320

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