About: Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture     Goto   Sponge   NotDistinct   Permalink

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Description
  • Using reactive DC sputtering in a gas aggregation cluster source, we show that pulsed discharge gives rise to a huge increase in deposition rate of nanoparticles by more than one order of magnitude compared to continuous operation. We suggest that this effect is caused by an equilibrium between slight target oxidation (during %22time-off) and subsequent sputtering of Ti oxides (sub-oxides) at %22time-on%22 with high power impulse.
  • Using reactive DC sputtering in a gas aggregation cluster source, we show that pulsed discharge gives rise to a huge increase in deposition rate of nanoparticles by more than one order of magnitude compared to continuous operation. We suggest that this effect is caused by an equilibrium between slight target oxidation (during %22time-off) and subsequent sputtering of Ti oxides (sub-oxides) at %22time-on%22 with high power impulse. (en)
Title
  • Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture
  • Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture (en)
skos:prefLabel
  • Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture
  • Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture (en)
skos:notation
  • RIV/00216208:11320/13:10145713!RIV14-GA0-11320___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA13-09853S), P(LD11032)
http://linked.open...iv/cisloPeriodika
  • 3
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 78284
http://linked.open...ai/riv/idVysledku
  • RIV/00216208:11320/13:10145713
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • efficiency; deposition; nanoclusters; cluster; thin-films; magnetron discharge (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [98451019930B]
http://linked.open...i/riv/nazevZdroje
  • Applied Physics Letters
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 103
http://linked.open...iv/tvurceVysledku
  • Zaporojtchenko, Vladimir
  • Biederman, Hynek
  • Polonskyi, Oleksandr
  • Ahadi, Amir Mohammad
  • Faupel, Franz
  • Peter, Tilo
  • Strunskus, Thomas
  • Hinz, Alexander
http://linked.open...ain/vavai/riv/wos
  • 000322146300094
issn
  • 0003-6951
number of pages
http://bibframe.org/vocab/doi
  • 10.1063/1.4816036
http://localhost/t...ganizacniJednotka
  • 11320
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