About: Semi insulating CdTe:Cl after elimination of inclusions and precipitates by post grown annealing     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
rdfs:seeAlso
Description
  • We present in this contribution results of two-step annealing, when the CdTe:Cl doped samples are at first annealed under Cd overpressure to remove inclusions and the re-annealed under Te overpressure to restore the high resistivity state. Investigation of samples after Cd rich annealing by infrared microscope has proven, that all inclusions are removed. Also Te nano precipitates were strongly influenced by the annealing process. The resistivity of the samples after Te-rich annealing was restored to values (similar to 10(8)-10(9) Omega cm). We observed, however, decrease of mobility-lifetime product of electrons from 10(-3)cm(2)/Vs to 10(-4)cm(2)/Vs. In order to understand the reason of this decrease we performed a study of point defects before and after annealing by thermoelectric effect spectroscopy. It shows a decrease of concentrations of most deep levels after two-step annealing. This behavior is completely different compared to past annealing studies, where concentration of deep levels strongly increased after annealing. The only level with an increased concentration in the current study is the midgap level (E similar to 0.8 eV). At the same time we observed increase of micro-twins in the samples investigated by transmission electron microscopy. The decrease of charge collection efficiency after two-step annealing may be therefore connected with re-arrangement of near midgap levels due to increase of concentrations of structure defects (micro twins, dislocations) that accumulate in their surroundings point defects with energy similar to 0.75 eV.
  • We present in this contribution results of two-step annealing, when the CdTe:Cl doped samples are at first annealed under Cd overpressure to remove inclusions and the re-annealed under Te overpressure to restore the high resistivity state. Investigation of samples after Cd rich annealing by infrared microscope has proven, that all inclusions are removed. Also Te nano precipitates were strongly influenced by the annealing process. The resistivity of the samples after Te-rich annealing was restored to values (similar to 10(8)-10(9) Omega cm). We observed, however, decrease of mobility-lifetime product of electrons from 10(-3)cm(2)/Vs to 10(-4)cm(2)/Vs. In order to understand the reason of this decrease we performed a study of point defects before and after annealing by thermoelectric effect spectroscopy. It shows a decrease of concentrations of most deep levels after two-step annealing. This behavior is completely different compared to past annealing studies, where concentration of deep levels strongly increased after annealing. The only level with an increased concentration in the current study is the midgap level (E similar to 0.8 eV). At the same time we observed increase of micro-twins in the samples investigated by transmission electron microscopy. The decrease of charge collection efficiency after two-step annealing may be therefore connected with re-arrangement of near midgap levels due to increase of concentrations of structure defects (micro twins, dislocations) that accumulate in their surroundings point defects with energy similar to 0.75 eV. (en)
Title
  • Semi insulating CdTe:Cl after elimination of inclusions and precipitates by post grown annealing
  • Semi insulating CdTe:Cl after elimination of inclusions and precipitates by post grown annealing (en)
skos:prefLabel
  • Semi insulating CdTe:Cl after elimination of inclusions and precipitates by post grown annealing
  • Semi insulating CdTe:Cl after elimination of inclusions and precipitates by post grown annealing (en)
skos:notation
  • RIV/00216208:11320/12:10125916!RIV13-GA0-11320___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GAP102/10/0148), S
http://linked.open...iv/cisloPeriodika
  • 12
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 167392
http://linked.open...ai/riv/idVysledku
  • RIV/00216208:11320/12:10125916
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • inclusions; CdTe; Solid state detectors (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [2358533A1C79]
http://linked.open...i/riv/nazevZdroje
  • Journal of Instrumentation
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 7
http://linked.open...iv/tvurceVysledku
  • Belas, Eduard
  • Franc, Jan
  • Grill, Roman
  • Hlídek, Pavel
  • Yang, G.
  • Bugár, Marek
  • Assali, S.
  • Castaldini, A.
  • Cavallini, A.
  • Fraboni, B.
http://linked.open...ain/vavai/riv/wos
  • 000310835200001
issn
  • 1748-0221
number of pages
http://bibframe.org/vocab/doi
  • 10.1088/1748-0221/7/11/C11001
http://localhost/t...ganizacniJednotka
  • 11320
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 48 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software