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Description
  • Two-step process that allows controlling independently roughness and chemical composition of plasma polymers, i.e., two parameters determining the wettability of such materials, is presented. In the first step a film composed of Ti nano-clusters is deposited on a smooth substrate. Nano-cluster films of different roughness can be obtained depending on deposition time. In the second step the nano-cluster films are overlaid by a thin layer of plasma polymer having the desired chemical structure. This approach allows the tuning of wettability of the deposited films to as much as 50% of the wettability of the films having the same chemical structure but deposited on a smooth substrate.
  • Two-step process that allows controlling independently roughness and chemical composition of plasma polymers, i.e., two parameters determining the wettability of such materials, is presented. In the first step a film composed of Ti nano-clusters is deposited on a smooth substrate. Nano-cluster films of different roughness can be obtained depending on deposition time. In the second step the nano-cluster films are overlaid by a thin layer of plasma polymer having the desired chemical structure. This approach allows the tuning of wettability of the deposited films to as much as 50% of the wettability of the films having the same chemical structure but deposited on a smooth substrate. (en)
Title
  • Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters
  • Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters (en)
skos:prefLabel
  • Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters
  • Control of Wettability of Plasma Polymers by Application of Ti Nano-Clusters (en)
skos:notation
  • RIV/00216208:11320/12:10124775!RIV13-AV0-11320___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(KAN101120701), P(LD11032), S, Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 128703
http://linked.open...ai/riv/idVysledku
  • RIV/00216208:11320/12:10124775
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • wettability; surface roughness; plasma polymers; nanostructures; gas aggregation cluster sources (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [361D6491516A]
http://linked.open...i/riv/nazevZdroje
  • PLASMA PROCESSES AND POLYMERS
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 9
http://linked.open...iv/tvurceVysledku
  • Kratochvíl, Jiří
  • Kylián, Ondřej
  • Artemenko, Anna
  • Biederman, Hynek
  • Drábik, Martin
  • Polonskyi, Oleksandr
  • Shukurov, Andrey
  • Slavínská, Danka
  • Solař, Pavel
http://linked.open...ain/vavai/riv/wos
  • 000300054000009
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
http://bibframe.org/vocab/doi
  • 10.1002/ppap.201100113
http://localhost/t...ganizacniJednotka
  • 11320
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