About: Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa

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About: Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://iopscience.iop.org/0963-0252/20/4/045018/pdf/0963-0252_20_4_045018.pdf
Description	The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency, capacitive coupled tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure, where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The main aim of this study was to provide characterization of this plasma source by means of a double Langmuir probe. The plasma source used in this work was designed to study the plasma polymerization process at pressures below 0.1 Pa. The source consists of the classical radio frequency, capacitive coupled tubular reactor enhanced by an external magnetic circuit. The working gas is introduced into the discharge by a capillary. This forms a relatively localized zone of higher pressure, where the monomer is activated. Due to the magnetic field, the plasma is constricted near the axis of the reactor with nearly collisionless gas flow. The main aim of this study was to provide characterization of this plasma source by means of a double Langmuir probe. (en)
Title	Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa (en)
skos:prefLabel	Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa (en)
skos:notation	RIV/00216208:11320/11:10105102!RIV12-AV0-11320___
http://linked.open...avai/riv/aktivita	P S Z
http://linked.open...avai/riv/aktivity	P(KAN101120701), S, Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	4
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Kousal, Jaroslav Čechvala, Juraj Biederman, Hynek Tichý, Milan
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	208931
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/11:10105102
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Films; Discharges; Glancing angle deposition (en)
http://linked.open.../riv/klicoveSlovo	Discharges Glancing angle deposition Films
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[5B23301A299B]
http://linked.open...i/riv/nazevZdroje	Plasma Sources Science and Technology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	20
http://linked.open...iv/tvurceVysledku	Biederman, Hynek Kousal, Jaroslav Čechvala, Juraj Šebek, Ondřej Tichý, Milan
http://linked.open...ain/vavai/riv/wos	000295829800020
http://linked.open...n/vavai/riv/zamer	Condensed Matter Physics – New Materials and Technologies
issn	0963-0252
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1088/0963-0252/20/4/045018
http://localhost/t...ganizacniJednotka	11320

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