About: Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene     Goto   Sponge   NotDistinct   Permalink

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Description
  • The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer CxFy molecules that reach the substrate and a lower flux of ions and CF2 radicals on the surface of growing film under such deposition conditions. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively.
  • The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer CxFy molecules that reach the substrate and a lower flux of ions and CF2 radicals on the surface of growing film under such deposition conditions. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. (en)
Title
  • Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene
  • Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene (en)
skos:prefLabel
  • Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene
  • Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene (en)
skos:notation
  • RIV/00216208:11320/11:10104741!RIV12-AV0-11320___
http://linked.open...avai/riv/aktivita
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  • P(KAN101120701)
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  • 19
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  • 193385
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  • RIV/00216208:11320/11:10104741
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  • X-ray photoelectron spectroscopy; Mass spectrometry; Polytetrafluoroethylene; Radio-frequency magnetron sputtering; Super-hydrophobicity (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV
  • [A799CA7B5E29]
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  • Thin Solid Films
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  • 519
http://linked.open...iv/tvurceVysledku
  • Kylián, Ondřej
  • Matolínová, Iva
  • Artemenko, Anna
  • Biederman, Hynek
  • Drábik, Martin
  • Gordeev, Ivan
  • Polonskyi, Oleksandr
  • Shukurov, Andrey
  • Slavínská, Danka
  • Čechvala, Juraj
http://linked.open...ain/vavai/riv/wos
  • 000292720000041
issn
  • 0040-6090
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.tsf.2011.04.213
http://localhost/t...ganizacniJednotka
  • 11320
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