About: Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet (en) Tok iontů na substrát během depozice tenkých vrstev v systému s plazmatickou tryskou (cs)
Title	Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet (en) Tok iontů na substrát během depozice tenkých vrstev v systému s plazmatickou tryskou (cs)
skos:prefLabel	Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet Measuring the Ion Current to the Substrate During Deposition of Thin Films by Hollow Cathode Plasma Jet (en) Tok iontů na substrát během depozice tenkých vrstev v systému s plazmatickou tryskou (cs)
skos:notation	RIV/00216208:11320/07:00004142!RIV08-GA0-11320___
http://linked.open.../vavai/riv/strany	212;217
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA202/06/0776)
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Virostko, Petr Tichý, Milan
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	432559
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/07:00004142
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Measuring; Current; Substrate; During; Deposition; Films; Hollow; Cathode; Plasma; Jet (en)
http://linked.open.../riv/klicoveSlovo	Jet Current Deposition Hollow Cathode Measuring Plasma Substrate During Films
http://linked.open...ontrolniKodProRIV	[CFB9F27A96C4]
http://linked.open...v/mistoKonaniAkce	Prague
http://linked.open...i/riv/mistoVydani	Prague
http://linked.open...i/riv/nazevZdroje	WDS´07 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced research and development of low-temperature plasma sources
http://linked.open...UplatneniVysledku	2007
http://linked.open...iv/tvurceVysledku	Tichý, Milan Virostko, Petr
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2007-01-01 (xsd:date)
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Matfyzpress
https://schema.org/isbn	978-80-7378-024-1
http://localhost/t...ganizacniJednotka	11320

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