About: Microwave PECVD of nanocrystalline diamond with rf induced bias nucleation

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Nanocrystalline diamond ﬁlm was deposited by microwave CVD in the ASTeX type reactor on a mirror polished (111) oriented n–doped silicon substrate. The deposition mix- ture consisted of 9 % of methane in hydrogen. The applied microwave power (2.45 GHz) and pressure were 850 W and 7.5 kPa, respectively. The substrate temperature was 1 090 K. The diamond nucleation process was enhanced by rf induced dc self–bias of -125 V. The ﬁlm exhibited very low roughness (rms of heights 9.1 nm). Its hardness and elastic modules were 70 and 375 GPa, respectively. The optical constants were determined by combination of spectroscopic ellipsometry and reﬂectometry employing the Rayleigh– Rice theory for the roughness and the dispersion model of optical constants based on the parameterization of densities of states. The deposition rate was 57 nm/min including the 5 min nucleation step. Nanocrystalline diamond ﬁlm was deposited by microwave CVD in the ASTeX type reactor on a mirror polished (111) oriented n–doped silicon substrate. The deposition mix- ture consisted of 9 % of methane in hydrogen. The applied microwave power (2.45 GHz) and pressure were 850 W and 7.5 kPa, respectively. The substrate temperature was 1 090 K. The diamond nucleation process was enhanced by rf induced dc self–bias of -125 V. The ﬁlm exhibited very low roughness (rms of heights 9.1 nm). Its hardness and elastic modules were 70 and 375 GPa, respectively. The optical constants were determined by combination of spectroscopic ellipsometry and reﬂectometry employing the Rayleigh– Rice theory for the roughness and the dispersion model of optical constants based on the parameterization of densities of states. The deposition rate was 57 nm/min including the 5 min nucleation step. (en)
Title	Microwave PECVD of nanocrystalline diamond with rf induced bias nucleation Microwave PECVD of nanocrystalline diamond with rf induced bias nucleation (en)
skos:prefLabel	Microwave PECVD of nanocrystalline diamond with rf induced bias nucleation Microwave PECVD of nanocrystalline diamond with rf induced bias nucleation (en)
skos:notation	RIV/00177016:_____/06:#0000305!RIV11-GA0-00177016
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/05/0607), Z(AV0Z20410507), Z(AV0Z20650511), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	2006
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Klapetek, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Český metrologický institut
http://linked.open...dnocenehoVysledku	485741
http://linked.open...ai/riv/idVysledku	RIV/00177016:_____/06:#0000305
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	PECVD (en)
http://linked.open.../riv/klicoveSlovo	PECVD
http://linked.open...odStatuVydavatele	CZ - Česká republika
http://linked.open...ontrolniKodProRIV	[F790D4395958]
http://linked.open...i/riv/nazevZdroje	Czechoslovak Journal of Physics
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	10 (xsd:int)
http://linked.open...vavai/riv/projekt	Synthesis of carbon micro- and nanostructures by plasma technologies
http://linked.open...UplatneniVysledku	2006
http://linked.open...v/svazekPeriodika	56
http://linked.open...iv/tvurceVysledku	Buršíková, V. Klapetek, Petr Franta, D. Zajíčková, L. Jašek, O. Karásková, M. Buršík, J. Matějková, J. Rek, A. Frgala, Z.
http://linked.open...n/vavai/riv/zamer	Physical properties of advanced materials in relation to their microstructure and processing Research into experimental methods for examination of the physical properties of matter and their application in advanced technologies Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0011-4626
number of pages	6 (xsd:int)

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