About: Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy

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About: Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	In this paper the results of optical and atomic force microscopy characterization of oxide thin films prepared by thermal oxidation of GaAs single crystal wafers at a temperature of 500degreesC in air are presented. The optical characterization is performed using multi-sample modification of the method based on combining variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. It is shown that the films exhibit the rough lower boundaries and refractive index profile inhomogeneities. The spectral dependences of the refractive index and extinction coefficient of these films are presented within the wide spectral region, i.e., 210-900 nm. The values of the thicknesses and roughness parameters characterizing the oxide films are introduced as well. In this paper the results of optical and atomic force microscopy characterization of oxide thin films prepared by thermal oxidation of GaAs single crystal wafers at a temperature of 500degreesC in air are presented. The optical characterization is performed using multi-sample modification of the method based on combining variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. It is shown that the films exhibit the rough lower boundaries and refractive index profile inhomogeneities. The spectral dependences of the refractive index and extinction coefficient of these films are presented within the wide spectral region, i.e., 210-900 nm. The values of the thicknesses and roughness parameters characterizing the oxide films are introduced as well. (en)
Title	Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy (en)
skos:prefLabel	Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy (en)
skos:notation	RIV/00177016:_____/04:#0000333!RIV11-GA0-00177016
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA101/01/1104), Z(MSM 143100003)
http://linked.open...iv/cisloPeriodika	8
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Klapetek, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Český metrologický institut
http://linked.open...dnocenehoVysledku	557430
http://linked.open...ai/riv/idVysledku	RIV/00177016:_____/04:#0000333
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	THERMAL-OXIDATION (en)
http://linked.open.../riv/klicoveSlovo	THERMAL-OXIDATION
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[4012E8FBFF90]
http://linked.open...i/riv/nazevZdroje	Surface and Interface Analysis
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry
http://linked.open...UplatneniVysledku	2004
http://linked.open...v/svazekPeriodika	36
http://linked.open...iv/tvurceVysledku	Franta, Daniel Klapetek, Petr Ohlídal, Ivan Ohlídal, Miloslav
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20143100003
issn	0142-2421
number of pages	4 (xsd:int)

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