About: New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	In this paper, a new optical method for characterizing thin ﬁlms exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reﬂectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin ﬁlm studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the ﬁlms studied. The method is illustrated through the optical analysis of strongly nonuniform thin ﬁlms formed by a mixture of CNx and SiOy deposited onto silicon single-crystal substrates. In this paper, a new optical method for characterizing thin ﬁlms exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reﬂectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin ﬁlm studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the ﬁlms studied. The method is illustrated through the optical analysis of strongly nonuniform thin ﬁlms formed by a mixture of CNx and SiOy deposited onto silicon single-crystal substrates. (en)
Title	New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters (en)
skos:prefLabel	New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters (en)
skos:notation	RIV/00177016:_____/03:#0000324!RIV11-GA0-00177016
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA101/01/1104), P(GA202/01/1110)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Klapetek, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Český metrologický institut
http://linked.open...dnocenehoVysledku	617861
http://linked.open...ai/riv/idVysledku	RIV/00177016:_____/03:#0000324
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	nonuniform films (en)
http://linked.open.../riv/klicoveSlovo	nonuniform films
http://linked.open...odStatuVydavatele	JP - Japonsko
http://linked.open...ontrolniKodProRIV	[2AAFC1557760]
http://linked.open...i/riv/nazevZdroje	Japanese Journal of Applied Physics
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry
http://linked.open...UplatneniVysledku	2003
http://linked.open...v/svazekPeriodika	42
http://linked.open...iv/tvurceVysledku	Klapetek, Petr Eliáš, M. Ohlídal, I. Ohlídal, M. Jákl, M. Čudek, V.
issn	0021-4922
number of pages	3 (xsd:int)

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