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  • Deposition of thin TiOx films by surfatron generated plasma (cs)
  • The paper reports first results of TiOx thin films deposition using surfatron produced discharge of jet type at reduced pressure. Plasma was created from Ar/O2 gas mixture flowing through a quartz tube inserted into the surfatron cavity powered by MW source working at frequency 2.45 GHz. Plasma crated in this manner is sustained further downstream by surface wave and exiting the tube. The vapours of titanium isopropoxide were delivered into the plasma bulk nearby the quartz tube outlet. The thin TiOx films were deposited on the heated glass substrates, distanced 8 mm from the end of the tube, up to 60 minutes. The results of deposited layers diagnostics - XRD, AFM and photoelectrochemical measurements - are discussed altogether as dependences on time of deposition.
  • The paper reports first results of TiOx thin films deposition using surfatron produced discharge of jet type at reduced pressure. Plasma was created from Ar/O2 gas mixture flowing through a quartz tube inserted into the surfatron cavity powered by MW source working at frequency 2.45 GHz. Plasma crated in this manner is sustained further downstream by surface wave and exiting the tube. The vapours of titanium isopropoxide were delivered into the plasma bulk nearby the quartz tube outlet. The thin TiOx films were deposited on the heated glass substrates, distanced 8 mm from the end of the tube, up to 60 minutes. The results of deposited layers diagnostics - XRD, AFM and photoelectrochemical measurements - are discussed altogether as dependences on time of deposition. (en)
Title
  • Deposition of thin TiOx films by surfatron generated plasma
  • Deposition of thin TiOx films by surfatron generated plasma (en)
  • Depozice tenkých TiOx pomocí surfatronem generovaného plazmatu (cs)
skos:prefLabel
  • Deposition of thin TiOx films by surfatron generated plasma
  • Deposition of thin TiOx films by surfatron generated plasma (en)
  • Depozice tenkých TiOx pomocí surfatronem generovaného plazmatu (cs)
skos:notation
  • RIV/60076658:12410/07:00008104!RIV08-GA0-12410___
http://linked.open...avai/riv/aktivita
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  • P(GA202/05/2242)
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  • 416248
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  • RIV/60076658:12410/07:00008104
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  • TiOx; anatase; XRD; AFM; surfatron (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...i/riv/kodPristupu
http://linked.open...ontrolniKodProRIV
  • [A54AFF0A42E7]
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  • Praha
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  • CD ROM
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  • Ústav fyziky plazmatu, AV ČR
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  • Krýsa, J.
  • Straňák, Vítězslav
  • Špatenka, Petr
  • Tichý, Milan
  • Hubička, Z.
  • Klusoň, P.
  • Kment, S.
  • Šíchová, H.
https://schema.org/isbn
  • 978-80-87026-00-7
http://localhost/t...ganizacniJednotka
  • 12410
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