About: Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study

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About: Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.surfcoat.2014.05.072
Description	Presence of a small fraction of high-energy particles in the total particle flux is an important factor which affects the structure of atom-by-atom deposited thin films. In this paper the role of high-energy (up to 400 eV) particles is studied by molecular dynamics simulations, focused on obtaining quantitative information not accessible experimentally. In the case of film-forming particles, the results show that one to few percent of high-energy atoms is sufficient for amorphization of otherwise crystalline materials. Consequently, all film-forming atoms have to be considered separately and have the optimum energy (optimum averaged energy per atom is insufficient). In the case of energetic bombardment by non film-forming particles such as Ar, the results show that the film amorphization can take place but it requires higher energies and/or much higher number of particle impacts compared to the former case. Presence of a small fraction of high-energy particles in the total particle flux is an important factor which affects the structure of atom-by-atom deposited thin films. In this paper the role of high-energy (up to 400 eV) particles is studied by molecular dynamics simulations, focused on obtaining quantitative information not accessible experimentally. In the case of film-forming particles, the results show that one to few percent of high-energy atoms is sufficient for amorphization of otherwise crystalline materials. Consequently, all film-forming atoms have to be considered separately and have the optimum energy (optimum averaged energy per atom is insufficient). In the case of energetic bombardment by non film-forming particles such as Ar, the results show that the film amorphization can take place but it requires higher energies and/or much higher number of particle impacts compared to the former case. (en)
Title	Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study (en)
skos:prefLabel	Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study (en)
skos:notation	RIV/49777513:23520/14:43923370!RIV15-GA0-23520___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA14-03875S)
http://linked.open...iv/cisloPeriodika	September 2014
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Houška, Jiří
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	41096
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/14:43923370
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Al2O3; molecular dynamics; high-energy ions; high-energy bombardment; ion-assisted deposition; crystal growth (en)
http://linked.open.../riv/klicoveSlovo	ion-assisted deposition Al2O3 crystal growth molecular dynamics high-energy bombardment high-energy ions
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[42DF996E50F3]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	1 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	254
http://linked.open...iv/tvurceVysledku	Houška, Jiří
http://linked.open...ain/vavai/riv/wos	000340977300016
issn	0257-8972
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2014.05.072
http://localhost/t...ganizacniJednotka	23520

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