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  • The compact repetition (10 Hz) capillary discharge XUV laser (CDL) was built and delivered to Prague by the XUV laser group at Colorado State University, Fort Collins, CO (head: Jorge J. Rocca) in 2007, according to the bilateral agreement between CSU and Institute of Physics of the Czech Academy of Sciences (IP-ASCR, Prague) on establishing the joint laboratory in Prague for utilization of this unique laser device. The source produces nanosecond pulses of coherent 46.9-nm radiation emitted due to lasing of Ne-like Ar ions collisionally excited in the pinching plasma of the capillary discharge. Thus, we have a laser beam of ionizing radiation ready for numerous applications in the joint laboratory. In this proposal, we would like to suggest studying irreversible changes induced on surfaces of various materials and nanostructures by the focused CDL beam. The radiation is very suitable for such studies because is both ionizing (a single photon of XUV radiation carries much more energy than a photon o (en)
  • Souhrnný cíl projektu spočívá v získání originálních vědeckých výsledků v oboru interakce extrémního ultrafialového laserového záření generovaného repetičním stolním kapilárním laserem (XUV CDL) s různými materiály.
Title
  • Radiation chemical applications of repetition capillary discharge XUV laser: processes on solid surfaces (en)
  • Radiačně chemické aplikace repetičního kapilárního XUV laseru: povrchy pevných látek
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  • ME10046
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  • XUV laser; table to XUV source; capillary discharge; non-Gaussian beam; material surface processing; astrobiology; radiobiology; development of high-flux XUV/X-ray optics; radiation damage (en)
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  • Selected molecular solids, ionic crystals, multilayer structures and plasmid DNA were irradiated by a single pulse and multiple pulses of extreme ultraviolet capillary-discharge laser (XUV CDL) at fluences above and below the single-shot damage threshold of a particular material, respectively. Observed damage patterns were utilized for characterization of focused beams of short-wavelength lasers. (en)
  • Vybrané molekulární pevné látky, iontové krystaly, mnohovrstvé struktury a plazmidová DNA byly ozářeny jedním nebo více pulzy záření extrémního ultrafialového (XUV) kapilárního laseru na fluencích vyšších resp. nižších než práh poškození příslušného materiálu jedním impulzem XUV laserového záření. Ablační/desorpční kontury byly využity k analýze rozložení intenzity záření ve fokusovaném svazku. (cs)
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  • XUV laser
  • capillary discharge
  • astrobiology
  • development of high-flux XUV/X-ray optics
  • material surface processing
  • non-Gaussian beam
  • radiobiology
  • table to XUV source
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