About: Radiation chemical applications of repetition capillary discharge XUV laser: processes on solid surfaces     Goto   Sponge   NotDistinct   Permalink

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  • The compact repetition (10 Hz) capillary discharge XUV laser (CDL) was built and delivered to Prague by the XUV laser group at Colorado State University, Fort Collins, CO (head: Jorge J. Rocca) in 2007, according to the bilateral agreement between CSU and Institute of Physics of the Czech Academy of Sciences (IP-ASCR, Prague) on establishing the joint laboratory in Prague for utilization of this unique laser device. The source produces nanosecond pulses of coherent 46.9-nm radiation emitted due to lasing of Ne-like Ar ions collisionally excited in the pinching plasma of the capillary discharge. Thus, we have a laser beam of ionizing radiation ready for numerous applications in the joint laboratory. In this proposal, we would like to suggest studying irreversible changes induced on surfaces of various materials and nanostructures by the focused CDL beam. The radiation is very suitable for such studies because is both ionizing (a single photon of XUV radiation carries much more energy than a photon o (en)
  • Souhrnný cíl projektu spočívá v získání originálních vědeckých výsledků v oboru interakce extrémního ultrafialového laserového záření generovaného repetičním stolním kapilárním laserem (XUV CDL) s různými materiály. (cs)
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  • Radiačně chemické aplikace repetičního kapilárního XUV laseru: povrchy pevných látek (cs)
  • Radiation chemical applications of repetition capillary discharge XUV laser: processes on solid surfaces (en)
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  • XUV laser; table to XUV source; capillary discharge; non-Gaussian beam; material surface processing; astrobiology; radiobiology; development of high-flux XUV/X-ray optics; radiation damage (en)
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