Attributes | Values |
---|
rdf:type
| |
Description
| - Prezentace nových výsledků vysoce intenzivního mikrofokusního EUV zdroje. Elipsoidální multifóliová optika fokusuje záření o energii 50 - 150 eV ze zdroje založeného na laserové plasmě. Popis a diskuze vývoje multifóliového kondenzoru, srovnání naměřených a předpovězených výsledků a EUV litografie a ablace materiálu. (cs)
- We present the recent progress in high intensity micro focused EUV beam generation. Ellipsoidal thin glass foils were used in Multi–foil optical systems for focusing radiation in 50 eV to 150 eV energy band from gas–puff laser plasma source. Multifoil optic (MFO) condenser was designed and tested for applications with Xe laser plasma gas–puff source. High intensity EUV beam focal spot was recorded, analyzed and compared with theoretical results from computer ray–tracing. Direct EUV lithography using radiation induced decomposition and ablation of TEFLON was studied.
- We present the recent progress in high intensity micro focused EUV beam generation. Ellipsoidal thin glass foils were used in Multi–foil optical systems for focusing radiation in 50 eV to 150 eV energy band from gas–puff laser plasma source. Multifoil optic (MFO) condenser was designed and tested for applications with Xe laser plasma gas–puff source. High intensity EUV beam focal spot was recorded, analyzed and compared with theoretical results from computer ray–tracing. Direct EUV lithography using radiation induced decomposition and ablation of TEFLON was studied. (en)
|
Title
| - EUV radiation from gas-puff laser plasma focused by
- EUV radiation from gas-puff laser plasma focused by (en)
- EUV záření z laserové plasmy fokusované multifóliovou optikou (cs)
|
skos:prefLabel
| - EUV radiation from gas-puff laser plasma focused by
- EUV radiation from gas-puff laser plasma focused by (en)
- EUV záření z laserové plasmy fokusované multifóliovou optikou (cs)
|
skos:notation
| - RIV/68407700:21340/06:04128227!RIV07-MSM-21340___
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/68407700:21340/06:04128227
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - EUV lithography; EUV radiation; gas-puff; laser plasma; x-ray optics (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...v/mistoKonaniAkce
| |
http://linked.open...i/riv/mistoVydani
| |
http://linked.open...i/riv/nazevZdroje
| - Advances in X-Ray/EUV Optics, Components, and Applications
|
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...iv/tvurceVysledku
| - Inneman, A.
- Pína, Ladislav
- Havlíková, Radka
- Švéda, Libor
- Semencová, V.
- Hudec, R.
- Bartnik, A.
- Fiedorowicz, H.
- Jakubczak, K.
|
http://linked.open...vavai/riv/typAkce
| |
http://linked.open.../riv/zahajeniAkce
| |
http://linked.open...n/vavai/riv/zamer
| |
number of pages
| |
http://purl.org/ne...btex#hasPublisher
| |
https://schema.org/isbn
| |
http://localhost/t...ganizacniJednotka
| |