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Description
| - Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties.
- Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers’ crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties. (en)
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Title
| - PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers
- PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers (en)
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skos:prefLabel
| - PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers
- PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers (en)
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skos:notation
| - RIV/68378271:_____/12:00382104!RIV13-AV0-68378271
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/12:00382104
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - pulsed laser deposition; titanium dioxide,; photocatalysis,; RF discharge; thin films (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Jelínek, Miroslav
- Mikšovský, Jan
- Remsa, J.
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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