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  • We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.
  • We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length. (en)
Title
  • 6-axis interferometric coordinates measurement system for nanometrology
  • 6-axis interferometric coordinates measurement system for nanometrology (en)
skos:prefLabel
  • 6-axis interferometric coordinates measurement system for nanometrology
  • 6-axis interferometric coordinates measurement system for nanometrology (en)
skos:notation
  • RIV/68081731:_____/14:00431959!RIV15-TA0-68081731
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • I, P(ED0017/01/01), P(EE2.4.31.0016), P(GPP102/11/P820), P(LO1212), P(TA02010711), P(TE01020233)
http://linked.open...vai/riv/dodaniDat
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  • 58342
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  • RIV/68081731:_____/14:00431959
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • nanometrology; AFM; nanoscale; nanopositioning interferometry (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [2258339EBB91]
http://linked.open...v/mistoKonaniAkce
  • San Francisco
http://linked.open...i/riv/mistoVydani
  • Bellingham
http://linked.open...i/riv/nazevZdroje
  • Photonic Instrumentation Engineering (Proceedings of Spie 8992)
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
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http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Hrabina, Jan
  • Klapetek, P.
  • Lazar, Josef
  • Číp, Ondřej
  • Čížek, Martin
  • Oulehla, Jindřich
  • Šerý, Mojmír
  • Holá, Miroslava
  • Valtr, M.
http://linked.open...vavai/riv/typAkce
http://linked.open...ain/vavai/riv/wos
  • 000337143700023
http://linked.open.../riv/zahajeniAkce
issn
  • 0277-786X
number of pages
http://bibframe.org/vocab/doi
  • 10.1117/12.2054802
http://purl.org/ne...btex#hasPublisher
  • SPIE
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