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rdf:type
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Description
| - Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripes which covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) and even higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistance in air up to 650 Celsius degrees, while the latter to 550 Celsius degrees.
- Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripes which covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) and even higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistance in air up to 650 Celsius degrees, while the latter to 550 Celsius degrees. (en)
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Title
| - Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering
- Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering (en)
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skos:prefLabel
| - Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering
- Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering (en)
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skos:notation
| - RIV/49777513:23520/13:43917535!RIV14-MSM-23520___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - I, P(ED1.1.00/02.0090), P(OC10045)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/13:43917535
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Oxidation resistance; Pulsed magnetron sputtering; Electrical conductivity; Hardness; Nanocrystalline Zr-B-C-N films (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Surface & Coatings Technology
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Zeman, Petr
- Vlček, Jaroslav
- Peřina, Vratislav
- Čerstvý, Radomír
- Steidl, Petr
- Kohout, Jiří
- Prokšová, Šárka
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1016/j.surfcoat.2012.08.084
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http://localhost/t...ganizacniJednotka
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