About: Photocatalytic nitrogen doped TiO2 thin films prepared by hybrid PLD technique at low temperature     Goto   Sponge   Distinct   Permalink

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  • In this study, we focused on preparation of nitrogen doped titanium oxides TiO2, (TiON) layers. The goal of the work is prepare visible light active (VLA) TiO2 by Pulsed laser deposition in combination with radiofrequency discharge (RF). Used RF power was up to 300W. There was no additional substrate heating, but the RF discharge alone heated the substrate up to 200°C. Photocatalytic activity was studied by 4-chlorphenole solution degradation at various wavelengths from UV to VIS. We observed shift of photocatalytic activity to visible region. Silicon wafers Si(111) were used as substrates. Crystalline structure was tested by XRD, composition by XPS. Thickness and roughness were determined by mechanical profilometry.
  • In this study, we focused on preparation of nitrogen doped titanium oxides TiO2, (TiON) layers. The goal of the work is prepare visible light active (VLA) TiO2 by Pulsed laser deposition in combination with radiofrequency discharge (RF). Used RF power was up to 300W. There was no additional substrate heating, but the RF discharge alone heated the substrate up to 200°C. Photocatalytic activity was studied by 4-chlorphenole solution degradation at various wavelengths from UV to VIS. We observed shift of photocatalytic activity to visible region. Silicon wafers Si(111) were used as substrates. Crystalline structure was tested by XRD, composition by XPS. Thickness and roughness were determined by mechanical profilometry. (en)
Title
  • Photocatalytic nitrogen doped TiO2 thin films prepared by hybrid PLD technique at low temperature
  • Photocatalytic nitrogen doped TiO2 thin films prepared by hybrid PLD technique at low temperature (en)
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  • Photocatalytic nitrogen doped TiO2 thin films prepared by hybrid PLD technique at low temperature
  • Photocatalytic nitrogen doped TiO2 thin films prepared by hybrid PLD technique at low temperature (en)
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  • RIV/68407700:21460/14:00224837!RIV15-MSM-21460___
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  • RIV/68407700:21460/14:00224837
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  • Hybrid PLD; nitrogen doped; titanim oxides; photocatalysis; low temperature (en)
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  • [FB09C470F423]
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  • Jelínek, Miroslav
  • Mikšovský, Jan
  • Remsa, Jan
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  • 21460
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