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  • The work is focused on analysis of interface of two different thick film layers. Contact resistance between conductive a resistive layers was measured and analyzed. Contact resistance is influenced by technology of deposition of layers, by conditions of curing, by materials and surface quality of substrate etc. Three point methods is used for measuring of contact resistance. This parameter was analyzed in dependence on geometry of contact area. Polymer thick film pastes were used for preparation of samples.
  • The work is focused on analysis of interface of two different thick film layers. Contact resistance between conductive a resistive layers was measured and analyzed. Contact resistance is influenced by technology of deposition of layers, by conditions of curing, by materials and surface quality of substrate etc. Three point methods is used for measuring of contact resistance. This parameter was analyzed in dependence on geometry of contact area. Polymer thick film pastes were used for preparation of samples. (en)
Title
  • The Contact Resistance at Interface of Two Different Thick Film Layers
  • The Contact Resistance at Interface of Two Different Thick Film Layers (en)
skos:prefLabel
  • The Contact Resistance at Interface of Two Different Thick Film Layers
  • The Contact Resistance at Interface of Two Different Thick Film Layers (en)
skos:notation
  • RIV/68407700:21230/08:00147332!RIV11-MSM-21230___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • S
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 361117
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21230/08:00147332
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • contact resistance; thick film layer (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [ABE8E048CB43]
http://linked.open...v/mistoKonaniAkce
  • Budapest
http://linked.open...i/riv/mistoVydani
  • New York
http://linked.open...i/riv/nazevZdroje
  • 31st International Spring Seminar on Electronics Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...UplatneniVysledku
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  • Beshajová Pelikánová, Ivana
  • Duraj, A.
  • Slovák, F.
http://linked.open...vavai/riv/typAkce
http://linked.open...ain/vavai/riv/wos
  • 000272337900102
http://linked.open.../riv/zahajeniAkce
number of pages
http://purl.org/ne...btex#hasPublisher
  • IEEE
https://schema.org/isbn
  • 978-1-4244-3973-7
http://localhost/t...ganizacniJednotka
  • 21230
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