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  • In this study nanosphere lithography (NSL) is demonstrated to be a low-cost, parallel and material independent fabrication process for creating periodic arrays of nanostructures using self-assembled nanospheres as templates. SA is the most feasible way to fabricate 2D or 3D colloidal crystals on large areas. After the mask preparation NSL uses different steps of plasma etching and deposition processes. The resulting patterned nanostructures have a wide range of applications in many important areas such as photonics, antireflection, surface wetting, biological and chemical sensing, solar cells, etc. This study focuses on an overview of applications of 2D colloidal crystals. First, structuring of substrate surfaces and the creation of various nano-objects (nanotips, nanopillars, nanocones) is shown. Next, direct growth of patterned structures (graphene nanomesh and diamond structures) is pointed out.
  • In this study nanosphere lithography (NSL) is demonstrated to be a low-cost, parallel and material independent fabrication process for creating periodic arrays of nanostructures using self-assembled nanospheres as templates. SA is the most feasible way to fabricate 2D or 3D colloidal crystals on large areas. After the mask preparation NSL uses different steps of plasma etching and deposition processes. The resulting patterned nanostructures have a wide range of applications in many important areas such as photonics, antireflection, surface wetting, biological and chemical sensing, solar cells, etc. This study focuses on an overview of applications of 2D colloidal crystals. First, structuring of substrate surfaces and the creation of various nano-objects (nanotips, nanopillars, nanocones) is shown. Next, direct growth of patterned structures (graphene nanomesh and diamond structures) is pointed out. (en)
Title
  • Applications of Self-assembled 2D Polystyrene Nanosphere Arrays
  • Applications of Self-assembled 2D Polystyrene Nanosphere Arrays (en)
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  • Applications of Self-assembled 2D Polystyrene Nanosphere Arrays
  • Applications of Self-assembled 2D Polystyrene Nanosphere Arrays (en)
skos:notation
  • RIV/68407700:21110/14:00220715!RIV15-MSM-21110___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • I, P(GBP108/12/G108), S
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
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http://linked.open...dnocenehoVysledku
  • 3881
http://linked.open...ai/riv/idVysledku
  • RIV/68407700:21110/14:00220715
http://linked.open...riv/jazykVysledku
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  • nanosphere lithography; nanostructuring; polystyrene microspheres; reactive ion etching (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [EA1E7C2C1C91]
http://linked.open...v/mistoKonaniAkce
  • Praha
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  • Praha
http://linked.open...i/riv/nazevZdroje
  • Nanomateriály a nanotechnologie ve stavebnictví 2014
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Demo, Pavel
  • Kromka, A.
  • Domonkos, Mária
  • Izak, T.
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
number of pages
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  • České vysoké učení technické v Praze
https://schema.org/isbn
  • 978-80-01-05512-0
http://localhost/t...ganizacniJednotka
  • 21110
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