About: Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and %22post-mortem%22 by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources. We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and %22post-mortem%22 by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources. (en)
Title	Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure (en)
skos:prefLabel	Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure (en)
skos:notation	RIV/68378271:_____/10:00342469!RIV11-MSM-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(IAA400100701), P(KAN300100702), P(LA08024), P(LC510), P(LC528), Z(AV0Z10100523)
http://linked.open...iv/cisloPeriodika	2
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Vyšín, Luděk Burian, Tomáš Cihelka, Jaroslav Chalupský, Jaromír Hájková, Věra Juha, Libor
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	287549
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/10:00342469
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	laser damage; thermal effects; multilayers; optical design and fabrication; free-electron lasers (en)
http://linked.open.../riv/klicoveSlovo	free-electron lasers laser damage multilayers optical design and fabrication thermal effects
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[D3BFA725FAAF]
http://linked.open...i/riv/nazevZdroje	Optics Express
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	28 (xsd:int)
http://linked.open...vavai/riv/projekt	Center of nanotechnology and materials for nanoelectronics Creating and probing nanostructures with X-ray lasers Research in the Frame of the International Center for Dense Magnetized Plasmas - ICDMP Centre of Laser Plasma Metal-Fullerene and Metal-Diamond Nanocomposites: Preparation, Characterization and Modification
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	18
http://linked.open...iv/tvurceVysledku	Burian, Tomáš Chalupský, Jaromír Hájková, Věra Juha, Libor Krzywinski, J. Vyšín, Luděk Bijkerk, F. Bruijn, S. Cihelka, Jaroslav Gleeson, A. Gullikson, E. M. Hau-Riege, S. Jurek, M. Khorsand, A. R. Klinger, D. London, R. Louis, E. Pelka, J. B. Sobierajski, R. Tiedtke, K. Toleikis, S. Wabnitz, H. van de Kruijs, R.W.E. Sokolowski-Tinten, K. Jastrow, U. Shymanovich, U. Stojanovic, N. van Hattum, E. D.
http://linked.open...ain/vavai/riv/wos	000273860400032
http://linked.open...n/vavai/riv/zamer	Intense Radiation Sources and Radiation-Matter Interaction
issn	1094-4087
number of pages	13 (xsd:int)
is http://linked.open...avai/riv/vysledek of	Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

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