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  • Higher content of hydrogen at lower T s facilitatesformation od order silicon phase even close to room temperature (the sample grown at 35 o C had 30at% of hydrogen and crystallinity .appreq.60%), providing a technological window for deposition of silicon thin films on cheap polymer substrates with electronic properties suitable for cells.
  • Higher content of hydrogen at lower T s facilitatesformation od order silicon phase even close to room temperature (the sample grown at 35 o C had 30at% of hydrogen and crystallinity .appreq.60%), providing a technological window for deposition of silicon thin films on cheap polymer substrates with electronic properties suitable for cells. (en)
Title
  • Structure and properties of silicon thin films deposited at low substrate temperatures.
  • Structure and properties of silicon thin films deposited at low substrate temperatures. (en)
skos:prefLabel
  • Structure and properties of silicon thin films deposited at low substrate temperatures.
  • Structure and properties of silicon thin films deposited at low substrate temperatures. (en)
skos:notation
  • RIV/68378271:_____/03:02030495!RIV/2004/AV0/A02004/N
http://linked.open.../vavai/riv/strany
  • L987;L989
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  • P(GA202/03/0789), P(IAA1010316), P(IAB2949101), Z(AV0Z1010914), Z(AV0Z1048901), Z(MSM 113200002)
http://linked.open...iv/cisloPeriodika
  • 8B
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  • 629245
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  • RIV/68378271:_____/03:02030495
http://linked.open...riv/jazykVysledku
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  • a-Si:H; .mu.c-Si:H; low-temperature growth; plastic substrates; crystallinity; hydrogen; electron transport (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • JP - Japonsko
http://linked.open...ontrolniKodProRIV
  • [DF23299C6D20]
http://linked.open...i/riv/nazevZdroje
  • Japanese Journal of Applied Physics. Pt. 2
http://linked.open...in/vavai/riv/obor
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  • 42
http://linked.open...iv/tvurceVysledku
  • Macková, Anna
  • Ledinský, Martin
  • Fejfar, Antonín
  • Pelant, Ivan
  • Ito, M.
  • Kočka, Jan
  • Fojtík, Petr
  • Baumruk, V.
  • Stuchlíková, The-Ha
  • Mates, Tomáš
  • Luterová, Kateřina
  • Ro, K.
  • Uyama, H.
http://linked.open...n/vavai/riv/zamer
issn
  • 0021-4922
number of pages
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