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  • Pseudomorphic overlayers adopt the lattice dimensions of the fcc substrate in the (111) plane and relax the interlayer distance. There are two possible stackings of the layers in the film: ABABAB..., giving the hcp structure, and ABCABC..., providing the trigonally distorted fcc structure. For nickel films, we predict the fcc layer stacking in the neighborhood of the ground state up to DNN equal to 5.25 a If the substrates have the DNN larger, the film should exhibit the hcp layer stacking. Cobalt films behave differently. Total energies of hcp structures are lower than energies of trigonally distorted fcc structures in the whole region studied.
  • Pseudomorphic overlayers adopt the lattice dimensions of the fcc substrate in the (111) plane and relax the interlayer distance. There are two possible stackings of the layers in the film: ABABAB..., giving the hcp structure, and ABCABC..., providing the trigonally distorted fcc structure. For nickel films, we predict the fcc layer stacking in the neighborhood of the ground state up to DNN equal to 5.25 a If the substrates have the DNN larger, the film should exhibit the hcp layer stacking. Cobalt films behave differently. Total energies of hcp structures are lower than energies of trigonally distorted fcc structures in the whole region studied. (en)
  • Pseudomorfní vrstva v rovině fcc (111) substrátů přijímá jeho mřížkovou konstantu a relaxuje mezirovinnou vzdáenost. Jsou dva možné způsoby uspořádání vrstev filmu: ABABAB... odpovídá hcp strukture a ABCABC... vede k trigonálně deformované struktůře. Pro niklové filmy předpovídáme fcc uspořádání vrstev v okolí základního stavu až po DNN = 5.25 a Jestliže má substrát větší DNN, film vykazuje hcp uspořádání. Kobalt se chová odlišně. Totální energie hcp struktury je nižší než energie trigonálně deformované struktury v celé studované oblasti. (cs)
Title
  • Ab initio study of Ni and Co thin films on (111) metallic substrates
  • Ab inito studium Ni a Co tenkých vrstev na (111) kovových substrátech (cs)
  • Ab initio study of Ni and Co thin films on (111) metallic substrates (en)
skos:prefLabel
  • Ab initio study of Ni and Co thin films on (111) metallic substrates
  • Ab inito studium Ni a Co tenkých vrstev na (111) kovových substrátech (cs)
  • Ab initio study of Ni and Co thin films on (111) metallic substrates (en)
skos:notation
  • RIV/68081723:_____/06:00048522!RIV07-AV0-68081723
http://linked.open.../vavai/riv/strany
  • 95;96
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA202/06/1509), P(GD106/05/H008), P(IAA1041302), P(IBS2041105), Z(AV0Z20410507)
http://linked.open...vai/riv/dodaniDat
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  • 463928
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  • RIV/68081723:_____/06:00048522
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • ab initio; thin films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [D738BCD4BD83]
http://linked.open...v/mistoKonaniAkce
  • Vienna
http://linked.open...i/riv/mistoVydani
  • Vienna
http://linked.open...i/riv/nazevZdroje
  • DFTEM 2006 - bringing together two communites
http://linked.open...in/vavai/riv/obor
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http://linked.open...vavai/riv/projekt
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  • Zelený, Martin
  • Šob, Mojmír
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • Editio Amici - Physicae et chimicae solidorum amici
https://schema.org/isbn
  • 3-902548-00-2
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