About: Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties.

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties. Goto Sponge Distinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Si-C-N films were deposited on p-type Si(I 0 0) substrates by dc magnetron co-sputtering of silicon and carbon using a single sputter target with variable Si/C area ratios in nitrogen-argon mixtures. The film characteristics were controlled by the silicon fraction (5-80%) in the erosion target area for a 50% N-2+50% Ar gas mixture and by the argon concentration (0-75%) in the gas mixture at a fixed 40% silicon fraction in the erosion target area. The total pressure and the discharge current on the magnetron target were held constant at p = 0.5 Pa and I-m = I A, the substrate temperature was adjusted at T-s = 600 degreesC by an ohmic heater and the r.f. induced negative substrate bias voltage, U-b was -500 V The films, typically 1.0-1.5 mum thick, were found to be amorphous with a very smooth surface (R(a)less than or equal to0.8 nm) and good adhesion to substrates. It was shown that not only the composition of the C-Si target but also the nitrogen-argon gas mixture composition makes it possible to con Si-C-N films were deposited on p-type Si(I 0 0) substrates by dc magnetron co-sputtering of silicon and carbon using a single sputter target with variable Si/C area ratios in nitrogen-argon mixtures. The film characteristics were controlled by the silicon fraction (5-80%) in the erosion target area for a 50% N-2+50% Ar gas mixture and by the argon concentration (0-75%) in the gas mixture at a fixed 40% silicon fraction in the erosion target area. The total pressure and the discharge current on the magnetron target were held constant at p = 0.5 Pa and I-m = I A, the substrate temperature was adjusted at T-s = 600 degreesC by an ohmic heater and the r.f. induced negative substrate bias voltage, U-b was -500 V The films, typically 1.0-1.5 mum thick, were found to be amorphous with a very smooth surface (R(a)less than or equal to0.8 nm) and good adhesion to substrates. It was shown that not only the composition of the C-Si target but also the nitrogen-argon gas mixture composition makes it possible to con (en)
Title	Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties. Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties. (en)
skos:prefLabel	Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties. Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties. (en)
skos:notation	RIV/61389005:_____/03:49033147!RIV/2004/AV0/A49004/N
http://linked.open.../vavai/riv/strany	1287;1294
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(ME 203), P(OC 527.90), Z(AV0Z1010914), Z(AV0Z1048901), Z(MSM 235200002)
http://linked.open...iv/cisloPeriodika	8
http://linked.open...vai/riv/dodaniDat	2004
http://linked.open...aciTvurceVysledku	Peřina, Vratislav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav jaderné fyziky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	624636
http://linked.open...ai/riv/idVysledku	RIV/61389005:_____/03:49033147
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	silicon-carbon-nitride films; magnetron co-sputtering (en)
http://linked.open.../riv/klicoveSlovo	magnetron co-sputtering silicon-carbon-nitride films
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[541D4DA58C86]
http://linked.open...i/riv/nazevZdroje	DIAMOND AND RELATED MATERIALS
http://linked.open...in/vavai/riv/obor	BG
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20203 http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20527.90
http://linked.open...UplatneniVysledku	2003
http://linked.open...v/svazekPeriodika	12
http://linked.open...iv/tvurceVysledku	Kormunda, M. Peřina, Vratislav Zemek, Josef Vlček, J. Čížek, J. Soukup, Z.
http://linked.open...n/vavai/riv/zamer	Theoretical and experimental investigation of atomic nuclei and exploitation of nuclear methods in interdisciplinary research Experimentální a teoretický výzkum kondenzovaných systémů s význačnými fyzikálními vlastnostmi http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20235200002
issn	0925-9635
number of pages	7 (xsd:int)

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software