About: Vapour pressure of metal-organic precursors

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The vapour pressure of four metal-organic precursors, diethylzinc, triethylantimony, trimethylgallium and trimethylaluminium used in the MOVPE processes was measured by a static method in the technologically important temperature range from 238 to 293 K. The experimental data were fitted by the Antoine equation and represent update values of the present day high purity materials providing comparison with the previously published data. The vapour pressure of four metal-organic precursors, diethylzinc, triethylantimony, trimethylgallium and trimethylaluminium used in the MOVPE processes was measured by a static method in the technologically important temperature range from 238 to 293 K. The experimental data were fitted by the Antoine equation and represent update values of the present day high purity materials providing comparison with the previously published data. (en)
Title	Vapour pressure of metal-organic precursors Vapour pressure of metal-organic precursors (en)
skos:prefLabel	Vapour pressure of metal-organic precursors Vapour pressure of metal-organic precursors (en)
skos:notation	RIV/60461373:22340/03:00007828!RIV/2004/GA0/223404/N
http://linked.open.../vavai/riv/strany	99-107
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA102/99/0414)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2004
http://linked.open...aciTvurceVysledku	Fulem, Michal Růžička, Květoslav Růžička, Vlastimil
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoká škola chemicko-technologická v Praze / Fakulta chemicko-inženýrská
http://linked.open...dnocenehoVysledku	632710
http://linked.open...ai/riv/idVysledku	RIV/60461373:22340/03:00007828
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	vapour pressure; static method; organometallic precursors; MOVPE; (en)
http://linked.open.../riv/klicoveSlovo	MOVPE static method vapour pressure organometallic precursors
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[B1899C7BD1E4]
http://linked.open...i/riv/nazevZdroje	Journal of Crystal Growth
http://linked.open...in/vavai/riv/obor	CF
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	MOVPE prepared materials and structures for electronic and optoelectronic devices
http://linked.open...UplatneniVysledku	2003
http://linked.open...v/svazekPeriodika	248
http://linked.open...iv/tvurceVysledku	Hulicius, Eduard Pangrác, Jiří Růžička, Vlastimil Růžička, Květoslav Fulem, Michal Melichar, Karel Šimeček, Tomislav Rushworth, S. A. Smith, L. M.
issn	0022-0248
number of pages	9 (xsd:int)
http://localhost/t...ganizacniJednotka	22340

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