Attributes | Values |
---|
rdf:type
| |
Description
| - The sequential sputtering technology was developed for the formation of transparent and conductive ZnO ultrathin ?lms (doped by Al, Ga) of thicknesses about 100 nm. When comparing continuous and sequential deposition modes, the latter increased the preferential [001] columnar texture of ZnO:(Ga, Al) ?lms, lowered their grain and crystallite sizes (25 nm/40 nm and 33 nm/47 nm), lattice stress gradients (0.147 GPa nm?1 /0.180 GPa nm?1) and microstrains (8.4x10?3 /5.6x10?3 ), rose their transmittance in Vis/NIR region (above 80%) and decreased their refractive index (values below 2).
- The sequential sputtering technology was developed for the formation of transparent and conductive ZnO ultrathin ?lms (doped by Al, Ga) of thicknesses about 100 nm. When comparing continuous and sequential deposition modes, the latter increased the preferential [001] columnar texture of ZnO:(Ga, Al) ?lms, lowered their grain and crystallite sizes (25 nm/40 nm and 33 nm/47 nm), lattice stress gradients (0.147 GPa nm?1 /0.180 GPa nm?1) and microstrains (8.4x10?3 /5.6x10?3 ), rose their transmittance in Vis/NIR region (above 80%) and decreased their refractive index (values below 2). (en)
|
Title
| - Surface morphology and crystalline structure of sequentially sputtered ZnO nanocoatings
- Surface morphology and crystalline structure of sequentially sputtered ZnO nanocoatings (en)
|
skos:prefLabel
| - Surface morphology and crystalline structure of sequentially sputtered ZnO nanocoatings
- Surface morphology and crystalline structure of sequentially sputtered ZnO nanocoatings (en)
|
skos:notation
| - RIV/49777513:23640/14:43922858!RIV15-MSM-23640___
|
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| |
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23640/14:43922858
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - Crystalline structure; Surface morphology; ZnO thin film; Sequential sputtering (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| |
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| |
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...v/svazekPeriodika
| |
http://linked.open...iv/tvurceVysledku
| - Netrvalová, Marie
- Novotný, I.
- Šutta, Pavol
- Tvarožek, V.
- Schaaf, P.
- Flickyngerová, S.
- Rossberg, D.
|
http://linked.open...ain/vavai/riv/wos
| |
issn
| |
number of pages
| |
http://bibframe.org/vocab/doi
| - 10.1016/j.apsusc.2014.05.121
|
http://localhost/t...ganizacniJednotka
| |