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Description
| - Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures.
- Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures. (en)
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Title
| - Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering
- Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering (en)
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skos:prefLabel
| - Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering
- Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering (en)
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skos:notation
| - RIV/49777513:23520/14:43922810!RIV15-GA0-23520___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/14:43922810
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Oxidation resistance; Electrical conductivity; Hardness; Pulsed magnetron sputtering; Nanocomposite materials; Hf-B-Si-C films (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Surface and Coatings Technology
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Houška, Jiří
- Mareš, Pavel
- Zeman, Petr
- Vlček, Jaroslav
- Čerstvý, Radomír
- Kohout, Jiří
- Jiang, Jiechao
- Meletis, Efstathios I.
- Zhang, Minghui
- Zuzjaková, Šárka
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1016/j.surfcoat.2013.12.007
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http://localhost/t...ganizacniJednotka
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