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Description
  • This article reports on ternary Ta-Si-N films with a high content of Si sputtered from an alloyed TaSi2 target using an unbalanced dc magnetron. The films were deposited under the following conditions: magnetron discharge current Id=1 and 2A, negative su
  • This article reports on ternary Ta-Si-N films with a high content of Si sputtered from an alloyed TaSi2 target using an unbalanced dc magnetron. The films were deposited under the following conditions: magnetron discharge current Id=1 and 2A, negative su (en)
  • Článek se zabývá systematickým zkoumáním závislostí struktury, prvkového složení, mechanických vlastností a oxidační odolnosti vrstev Zr-Si-N s vysokým obsahem Si na depozičních parametrech. Vrstvy byly deponovány magnetronovým naprašováním z keramického (cs)
Title
  • Physical and mechanical properties of sputtered Ta-Si-N films with a high content of Si
  • Physical and mechanical properties of sputtered Ta-Si-N films with a high content of Si (en)
  • Fyzikální a mechanické vlastnosti naprašovaných vrstev Ta-Si-N s vysokým obsahem křemíku (cs)
skos:prefLabel
  • Physical and mechanical properties of sputtered Ta-Si-N films with a high content of Si
  • Physical and mechanical properties of sputtered Ta-Si-N films with a high content of Si (en)
  • Fyzikální a mechanické vlastnosti naprašovaných vrstev Ta-Si-N s vysokým obsahem křemíku (cs)
skos:notation
  • RIV/49777513:23520/04:00000254!RIV/2005/MSM/235205/N
http://linked.open.../vavai/riv/strany
  • 646-649
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ME 529), Z(MSM 235200002)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 579488
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/04:00000254
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Ta-Si-N; sputtering; resistivity; oxidation; mechanical properties (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [69BE2FE31E9F]
http://linked.open...i/riv/nazevZdroje
  • Journal of Vacuum Science and Technology A
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 22
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zeman, Petr
  • Zeman, Hynek
http://linked.open...n/vavai/riv/zamer
issn
  • 0734-2101
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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