About: High-power pulsed magnetron sputtering with a grooved target

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Pulsed magnetron sputtering is a new progressive method of film deposition, which is applicable to master a reproducible formation of insulating films, e.g. oxides, with a high deposition rate close to that of pure metals, and also in other applications , where very high rates of film deposition and ionized coating particles are needed. We show that magnetron equiped with a grooved target makes it possible to significantly decrease the magnetron pulse voltage. Then the ionized high-rate sputtering, req uiring a high average target power loading in a pulse, can be realized at the repetition frequencies in the range from 10 to 50 kHz. Pulsed magnetron sputtering is a new progressive method of film deposition, which is applicable to master a reproducible formation of insulating films, e.g. oxides, with a high deposition rate close to that of pure metals, and also in other applications , where very high rates of film deposition and ionized coating particles are needed. We show that magnetron equiped with a grooved target makes it possible to significantly decrease the magnetron pulse voltage. Then the ionized high-rate sputtering, req uiring a high average target power loading in a pulse, can be realized at the repetition frequencies in the range from 10 to 50 kHz. (en)
Title	High-power pulsed magnetron sputtering with a grooved target High-power pulsed magnetron sputtering with a grooved target (en)
skos:prefLabel	High-power pulsed magnetron sputtering with a grooved target High-power pulsed magnetron sputtering with a grooved target (en)
skos:notation	RIV/49777513:23520/03:00000135!RIV/2004/MSM/235204/N
http://linked.open.../vavai/riv/strany	48-49
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(ME 529), Z(MSM 235200002)
http://linked.open...vai/riv/dodaniDat	2004
http://linked.open...aciTvurceVysledku	Leština, Jan Vlček, Jaroslav Musil, Jindřich Lukáš, Jan
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	608860
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/03:00000135
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	pulsed magnetron sputtering;thin films;high power;discharge characteristics;grooved target (en)
http://linked.open.../riv/klicoveSlovo	pulsed magnetron sputtering high power thin films discharge characteristics grooved target
http://linked.open...ontrolniKodProRIV	[B6780487E3AD]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Brno
http://linked.open...i/riv/nazevZdroje	JUNIORMAT '03
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20529
http://linked.open...UplatneniVysledku	2003
http://linked.open...iv/tvurceVysledku	Musil, Jindřich Vlček, Jaroslav Lukáš, Jan Leština, Jan
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2003-09-23 (xsd:date)
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20235200002
number of pages	2 (xsd:int)
http://purl.org/ne...btex#hasPublisher	University of Technology
https://schema.org/isbn	80-214-2462-1
http://localhost/t...ganizacniJednotka	23520

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