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  • Aluminum nitrides layers prepared on sapphire substrates are examined. The substrate surface was treated by dry plasma etching. The morphology of aluminum nitride thin films was studied by atomic force microscopy. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films morphology on the formation conditions has been defined. The objective of the study contributes to the improvement of technological process of dry etching and film deposition.
  • Aluminum nitrides layers prepared on sapphire substrates are examined. The substrate surface was treated by dry plasma etching. The morphology of aluminum nitride thin films was studied by atomic force microscopy. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films morphology on the formation conditions has been defined. The objective of the study contributes to the improvement of technological process of dry etching and film deposition. (en)
Title
  • Substrate Preparation for Manufacturing of Aluminum Nitride Layers
  • Substrate Preparation for Manufacturing of Aluminum Nitride Layers (en)
skos:prefLabel
  • Substrate Preparation for Manufacturing of Aluminum Nitride Layers
  • Substrate Preparation for Manufacturing of Aluminum Nitride Layers (en)
skos:notation
  • RIV/00216305:26220/13:PU106025!RIV14-GA0-26220___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ED2.1.00/03.0072), P(GAP102/11/0995)
http://linked.open...iv/cisloPeriodika
  • 5
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 108913
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26220/13:PU106025
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • aluminum oxide, aluminum nitride, dry etching (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [1CC03E4080C5]
http://linked.open...i/riv/nazevZdroje
  • ElectroScope - http://www.electroscope.zcu.cz
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 2013
http://linked.open...iv/tvurceVysledku
  • Tománek, Pavel
  • Dallaeva, Dinara
issn
  • 1802-4564
number of pages
http://localhost/t...ganizacniJednotka
  • 26220
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