About: Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition. Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition. (en)
Title	Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering (en)
skos:prefLabel	Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering (en)
skos:notation	RIV/00216305:26220/13:PU103517!RIV15-MSM-26220___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0072), P(GAP102/11/0995)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Dallaeva, Dinara
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta elektrotechniky a komunikačních technologií
http://linked.open...dnocenehoVysledku	89589
http://linked.open...ai/riv/idVysledku	RIV/00216305:26220/13:PU103517
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	dry etching, epitaxy, substrate, thin film, scanning probe microscopy (en)
http://linked.open.../riv/klicoveSlovo	scanning probe microscopy epitaxy dry etching substrate thin film
http://linked.open...ontrolniKodProRIV	[914C5E3A5BDF]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Brno University of Technology
http://linked.open...i/riv/nazevZdroje	Proceedings of the 19th Conference Student EEICT 2013
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	1 (xsd:int)
http://linked.open...vavai/riv/projekt	Centre of sensor, information and communication systems Electron transport, Noise and Diagnostic of Shottky and Autoemission Cathodes
http://linked.open...UplatneniVysledku	2013
http://linked.open...iv/tvurceVysledku	Dallaeva, Dinara
http://linked.open...vavai/riv/typAkce	CST - Celostátní
http://linked.open.../riv/zahajeniAkce	2013-04-25 (xsd:date)
number of pages	5 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Litera, Tabor 43a, 61200 Brno
https://schema.org/isbn	978-80-214-4695-3
http://localhost/t...ganizacniJednotka	26220

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