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| rdf:type
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| Description
| - Koncentrace elektronů, energie elektronů, plazmový potenciál a rozdělovací funkce energie iontů, v argonu a dusíku. Byla použita Langmuirova sonda a PPM Balzers. Oba diagnostické přístroje byly umístěny paraleně s rovinou elektrod. Pohyblivé elektrody umožňují získat prostorové rozložení parametrů mezi elektrodami. Rozdělovací funkce energie iontu je za vysokých výkonu stejná jako pro zemněnou elektrodu. Projevuje se zde jeden intenzivní pík typický pro stěnové vrstvy u elektrod s malou amplitudou. Střední energie Ar+ a N2+ iontů je zhruba 92% energie odpovídající plazmovému potenciálu. Objevuje se nízkoenergetický pás. Z toho usuzujeme na srážky ve stěnové vrstvě, které nejsou pozorovány pro N+ ionty. Průběh střední energie iontů je ve shodě s průběhem plazmového potenciálu. Koncentrace elektronů a iontů mají stejný profil. Asymetrie výboje ověřována z poměru ploch elektrod zízkaných z plazmového potenciálu a stejnosměrného předpětí na základě několika modelů. Pozorována výkonová změna tohoto paramet (cs)
- Plasma potential, electron concentration and IED collected by grounded surface were measured in Ar and nitrogen capacitively coupled r.f. discharges. Langmuir probe and Balzers Plasma Process Monitor (PPM 421), oriented parallel to the movable electrodes allowing a perpendicular spatially resolved measurements. The asymmetry of capacitive coupling estimated from the plasma potential and d.c. self-bias increase for increasing power since the discharge extended towards the grounded PPM orifice, its tubular housing as well as chamber walls. The IEDs measured with PPM reflected the situation at the grounded electrode. It exhibited only one peak which was typically found for low voltage modulated r.f. sheaths. The mean energy of ions depends on their mean free paths. This can be explained by collisions in the sheath. The ion mean energies decreased towards the grounded electrodes in agreement with the plasma potential. The ion and electron concentrations showed similar profiles.
- Plasma potential, electron concentration and IED collected by grounded surface were measured in Ar and nitrogen capacitively coupled r.f. discharges. Langmuir probe and Balzers Plasma Process Monitor (PPM 421), oriented parallel to the movable electrodes allowing a perpendicular spatially resolved measurements. The asymmetry of capacitive coupling estimated from the plasma potential and d.c. self-bias increase for increasing power since the discharge extended towards the grounded PPM orifice, its tubular housing as well as chamber walls. The IEDs measured with PPM reflected the situation at the grounded electrode. It exhibited only one peak which was typically found for low voltage modulated r.f. sheaths. The mean energy of ions depends on their mean free paths. This can be explained by collisions in the sheath. The ion mean energies decreased towards the grounded electrodes in agreement with the plasma potential. The ion and electron concentrations showed similar profiles. (en)
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| Title
| - Spatially resolved measurements in r.f. capacitive discharges in argon and nitrogen
- Spatially resolved measurements in r.f. capacitive discharges in argon and nitrogen (en)
- Prostorově rozlišené měření v rf kapacitním výboji v argonu a dusíku (cs)
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| skos:prefLabel
| - Spatially resolved measurements in r.f. capacitive discharges in argon and nitrogen
- Spatially resolved measurements in r.f. capacitive discharges in argon and nitrogen (en)
- Prostorově rozlišené měření v rf kapacitním výboji v argonu a dusíku (cs)
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| skos:notation
| - RIV/00216224:14310/04:00010149!RIV08-MSM-14310___
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(ME 489), P(OC 527.20), Z(MSM 143100003)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/00216224:14310/04:00010149
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - r.f. capacitive discharge; ion energy distribution; electron energy distribution (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...odStatuVydavatele
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
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| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
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| http://linked.open...vavai/riv/projekt
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| http://linked.open...UplatneniVysledku
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| http://linked.open...v/svazekPeriodika
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| http://linked.open...iv/tvurceVysledku
| - Janča, Jan
- Zajíčková, Lenka
- Šmíd, Radek
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| http://linked.open...n/vavai/riv/zamer
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| issn
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| number of pages
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| http://localhost/t...ganizacniJednotka
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