About: Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1021/jp1121646
Description	Adjustable morphology and degree of reduction represent desirable properties of model oxide substrates for heterogeneous catalysis. We investigate these properties in CeO(2) (ceria) thin films on Cu(111) using scanning tunneling microscopy and photoelectron spectroscopy. We identify growth mechanisms of ceria on Cu(111) formation of incomplete oxide inter acial layer and formation of three-dimensional ceria pyramids by stacking of monolayer-high islands. Using these mechanisms, we control the coverage, the number of open monolayers, and the-setp density of ceria thin films on Cu(111). Annealing in vacuum allows us to control besides the morphology also the degree of ceria surface reduction. We find a correlation between surface reduction and morphological stability in annealed ceria layers. Oriented and stoichiometric thin films of ceria on Cu(111) can be prepared at temperatures as low as 150 and 250 degrees C. Both the morphology and the surface reduction of these films readily change with increasing temperature, which must be accounted for in considering temperature programmed experiments with ceria on Cu(111). Adjustable morphology and degree of reduction represent desirable properties of model oxide substrates for heterogeneous catalysis. We investigate these properties in CeO(2) (ceria) thin films on Cu(111) using scanning tunneling microscopy and photoelectron spectroscopy. We identify growth mechanisms of ceria on Cu(111) formation of incomplete oxide inter acial layer and formation of three-dimensional ceria pyramids by stacking of monolayer-high islands. Using these mechanisms, we control the coverage, the number of open monolayers, and the-setp density of ceria thin films on Cu(111). Annealing in vacuum allows us to control besides the morphology also the degree of ceria surface reduction. We find a correlation between surface reduction and morphological stability in annealed ceria layers. Oriented and stoichiometric thin films of ceria on Cu(111) can be prepared at temperatures as low as 150 and 250 degrees C. Both the morphology and the surface reduction of these films readily change with increasing temperature, which must be accounted for in considering temperature programmed experiments with ceria on Cu(111). (en)
Title	Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111) Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111) (en)
skos:prefLabel	Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111) Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111) (en)
skos:notation	RIV/00216208:11320/11:10108232!RIV12-GA0-11320___
http://linked.open...avai/predkladatel	Matematicko-fyzikální fakulta
http://linked.open...avai/riv/aktivita	P S
http://linked.open...avai/riv/aktivity	P(GA202/07/0782), P(LA08022), P(LC06058), P(MEB100901), S
http://linked.open...iv/cisloPeriodika	15
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Dvořák, Filip Mysliveček, Josef Tsud, Nataliya Matolínová, Iva Škoda, Michal Matolín, Vladimír Stetsovych, Oleksandr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	184661
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/11:10108232
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	thin films; surface reduction; CeO2(111) (en)
http://linked.open.../riv/klicoveSlovo	CeO2(111) surface reduction thin films
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[A4BD8F958BA5]
http://linked.open...i/riv/nazevZdroje	Journal of Physical Chemistry C
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	10 (xsd:int)
http://linked.open...vavai/riv/projekt	Participation of Czech scientists in synchrotron radiation experiments at Elettra Reactivity of model catalyst based on CeOx Center of synchrotron radiation materials study Metal-induced surface defects on ceria
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	115
http://linked.open...iv/tvurceVysledku	Cherradi, E. Dvořák, Filip Matolín, Vladimír Matolínová, Iva Mysliveček, Josef Skala, T. Steger, M. Stetsovych, Oleksandr Tsud, Nataliya Škoda, Michal
http://linked.open...ain/vavai/riv/wos	000289403200043
issn	1932-7447
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1021/jp1121646
http://localhost/t...ganizacniJednotka	11320
is http://linked.open...avai/riv/vysledek of	Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111) Adjusting Morphology and Surface Reduction of CeO(2)(111) Thin Films on Cu(111)

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