About: Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://www.springerlink.com/content/87417434v1552n2w/
Description	Iodine-containing polishing etchants were tested on CdTe and CdZnTe surfaces with different orientations. The nature of the chemical dissolution of CdTe with (111)A, (111)B, (110), and (100) orientations in the I2-methanol solution was studied. It was established that this dissolution is diffusion controlled. The study of the chemical composition and structure of the (211)B CdZnTe surfaces etched under different conditions was carried out. X-ray photoelectron spectroscopy (XPS) measurements showed that a stoichiometric surface was achieved after short heating of the etched surface in vacuum. Iodine-containing polishing etchants were tested on CdTe and CdZnTe surfaces with different orientations. The nature of the chemical dissolution of CdTe with (111)A, (111)B, (110), and (100) orientations in the I2-methanol solution was studied. It was established that this dissolution is diffusion controlled. The study of the chemical composition and structure of the (211)B CdZnTe surfaces etched under different conditions was carried out. X-ray photoelectron spectroscopy (XPS) measurements showed that a stoichiometric surface was achieved after short heating of the etched surface in vacuum. (en)
Title	Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions (en)
skos:prefLabel	Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions (en)
skos:notation	RIV/00216208:11320/11:10106112!RIV12-MSM-11320___
http://linked.open...avai/predkladatel	Matematicko-fyzikální fakulta
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	8
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Höschl, Pavel Moravec, Pavel Franc, Jan Ulrych, Jan Mašek, Karel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	190123
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/11:10106112
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	RHEED; XPS; chemical etching; CdZnTe; CdTe (en)
http://linked.open.../riv/klicoveSlovo	CdTe RHEED XPS CdZnTe chemical etching
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[8C5E9F549E64]
http://linked.open...i/riv/nazevZdroje	Journal of Electronic Materials
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	40
http://linked.open...iv/tvurceVysledku	Chukhnenko, P. S. Franc, Jan Höschl, Pavel Ivanits'ka, V. G. Mašek, Karel Moravec, Pavel Tomashik, V. M. Tomashik, Z.F. Ulrych, Jan
http://linked.open...ain/vavai/riv/wos	000292466000032
http://linked.open...n/vavai/riv/zamer	Condensed Matter Physics – New Materials and Technologies
issn	0361-5235
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1007/s11664-011-1649-2
http://localhost/t...ganizacniJednotka	11320
is http://linked.open...avai/riv/vysledek of	Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions Chemical polishing of CdTe and CdZnTe in iodine-methanol etching solutions

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