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Description
| - Cerium oxide deposited by physical vapor deposition of cerium in an oxygen atmosphere on Cu(111) surface growth epitaxially with CeO2(1 1 1) plane parallel to the Cu(111) plane. The growth and morphology of CeO2(1 1 1) films were investigated by means of low energy electron diffraction (LEED) and scanning tunneling microscopy (STM). LEED shows good long range ordering and STM reveals a three-dimensional growth mode (Vollmer-Weber) with formation of a closed film only at larger thickness. Closed and atomically flat ceria films of larger thickness (3 ML) are obtained by applying a multistep preparation procedure, in which successive ceria layers are homoepitaxially grown on this initial film. The ceria films show similarities with the morphology of CeO2(1 1 1) single crystal surfaces, suggesting the possibility to model bulk ceria by thin film systems.
- Cerium oxide deposited by physical vapor deposition of cerium in an oxygen atmosphere on Cu(111) surface growth epitaxially with CeO2(1 1 1) plane parallel to the Cu(111) plane. The growth and morphology of CeO2(1 1 1) films were investigated by means of low energy electron diffraction (LEED) and scanning tunneling microscopy (STM). LEED shows good long range ordering and STM reveals a three-dimensional growth mode (Vollmer-Weber) with formation of a closed film only at larger thickness. Closed and atomically flat ceria films of larger thickness (3 ML) are obtained by applying a multistep preparation procedure, in which successive ceria layers are homoepitaxially grown on this initial film. The ceria films show similarities with the morphology of CeO2(1 1 1) single crystal surfaces, suggesting the possibility to model bulk ceria by thin film systems. (en)
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Title
| - A route to continuous ultra-thin cerium oxide films on Cu(1 1 1)
- A route to continuous ultra-thin cerium oxide films on Cu(1 1 1) (en)
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skos:prefLabel
| - A route to continuous ultra-thin cerium oxide films on Cu(1 1 1)
- A route to continuous ultra-thin cerium oxide films on Cu(1 1 1) (en)
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skos:notation
| - RIV/00216208:11320/09:00206339!RIV10-MSM-11320___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/00216208:11320/09:00206339
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - route; continuous; ultra-thin; cerium; oxide; films (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Matolín, Vladimír
- Lykhach, Y.
- Staudt, T.
- Hammer, L.
- Libuda, L.
- Schneider, M. A.
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://localhost/t...ganizacniJednotka
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is http://linked.open...avai/riv/vysledek
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