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rdf:type
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Description
| - Thin SiC x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700°C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions.
- Thin SiC x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700°C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions. (en)
- Tenké SiCx vrstvy byly připravené pomocí hybridní laserové magnetronové depozice. (cs)
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Title
| - Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition
- Tenké SiCx vrstvy připravené pomocí hybridní laserové magnetronové depozice (cs)
- Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition (en)
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skos:prefLabel
| - Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition
- Tenké SiCx vrstvy připravené pomocí hybridní laserové magnetronové depozice (cs)
- Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition (en)
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skos:notation
| - RIV/68407700:21460/08:12148102!RIV09-MSM-21460___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(GA202/06/0216), S, Z(AV0Z10100522), Z(MSM6840770012)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68407700:21460/08:12148102
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - hybrid laser-magnetron deposition; thin layer (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Applied Physics A: Materials Science and Processing
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Jelínek, Miroslav
- Kocourek, Tomáš
- Novotný, M.
- Kadlec, J.
- Zemek, J.
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://localhost/t...ganizacniJednotka
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