About: Thin-film limit formalism applied to surface defect absorption

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-22-25-31466
Description	The thin-film limit is derived by a nonconventional approach and equations for transmittance, reflectance and absorptance are presented in highly versatile and accurate form. In the thin-film limit the optical properties do not depend on the absorption coefficient, thickness and refractive index individually, but only on their product. We show that this formalism is applicable to the problem of ultrathin defective layer e.g. on a top of a layer of amorphous silicon. We develop a new method of direct evaluation of the surface defective layer and the bulk defects. Applying this method to amorphous silicon on glass, we show that the surface defective layer differs from bulk amorphous silicon in terms of light soaking. The thin-film limit is derived by a nonconventional approach and equations for transmittance, reflectance and absorptance are presented in highly versatile and accurate form. In the thin-film limit the optical properties do not depend on the absorption coefficient, thickness and refractive index individually, but only on their product. We show that this formalism is applicable to the problem of ultrathin defective layer e.g. on a top of a layer of amorphous silicon. We develop a new method of direct evaluation of the surface defective layer and the bulk defects. Applying this method to amorphous silicon on glass, we show that the surface defective layer differs from bulk amorphous silicon in terms of light soaking. (en)
Title	Thin-film limit formalism applied to surface defect absorption Thin-film limit formalism applied to surface defect absorption (en)
skos:prefLabel	Thin-film limit formalism applied to surface defect absorption Thin-film limit formalism applied to surface defect absorption (en)
skos:notation	RIV/68407700:21230/14:00225012!RIV15-MSM-21230___
http://linked.open...avai/riv/aktivita	I P V
http://linked.open...avai/riv/aktivity	I, P(7E12029), P(GA14-05053S), V
http://linked.open...iv/cisloPeriodika	25
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Holovský, Jakub
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta elektrotechnická
http://linked.open...dnocenehoVysledku	50433
http://linked.open...ai/riv/idVysledku	RIV/68407700:21230/14:00225012
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	thin films; optical properties; absorption (en)
http://linked.open.../riv/klicoveSlovo	absorption optical properties thin films
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[DF6A282B8F24]
http://linked.open...i/riv/nazevZdroje	Optics Express
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	Accelerated development and prototyping of nano-technology-based high-efficiency thin-film silicon solar modules (%22Fast Track%22) Preparation and properties of nanocrystalline diamond for photonic applications
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	22
http://linked.open...iv/tvurceVysledku	Holovský, Jakub Ballif, C.
http://linked.open...ain/vavai/riv/wos	000346368800141
issn	1094-4087
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1364/OE.22.031466
http://localhost/t...ganizacniJednotka	21230

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