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Description
| - The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
- The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films. (en)
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Title
| - Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
- Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina (en)
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skos:prefLabel
| - Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
- Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina (en)
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skos:notation
| - RIV/68378271:_____/10:00351378!RIV11-GA0-68378271
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(GP202/09/P324), P(IAA100100718), P(KAN400100653), Z(AV0Z10100522)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/10:00351378
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - aluminium oxide; ion-energy distribution function; magnetron; mass spectrometry; pulsed discharges (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Plasma Processes and Polymers
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Lančok, Ján
- Musil, Jindřich
- Novotný, Michal
- Pokorný, Petr
- Bulíř, Jiří
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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