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rdf:type
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Description
| - Amorfní uhlíková (a-C) optická pokrytí vysoké kvality tloušťky 45 nm deponovaná magnetronovým naprašováním na křemíkových substrátech byla ozářena fokusovaným svazkem kapilárním výbojovým XUV laserem. Zjistili jsme, že expozice 10, 20 a 40 pulzy vedla k poškození povrchu při fluenci 0.5 J/cm2, tedy bezpečně pod prahem poškození jedním impulzem (cs)
- High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate were irradiated by the focused beam of capillary-discharge Ne-like Ar XUV laser (CDL). Investigating consequences of the multiple-shot exposure it has been found that an accumulation of 10, 20 and 40 shots at a fluence of 0.5 J/cm2, i.e., below the single-shot damage threshold, causes irreversible changes of a-C thin layer which can be registered by both the AFM and the DIC microscopy
- High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate were irradiated by the focused beam of capillary-discharge Ne-like Ar XUV laser (CDL). Investigating consequences of the multiple-shot exposure it has been found that an accumulation of 10, 20 and 40 shots at a fluence of 0.5 J/cm2, i.e., below the single-shot damage threshold, causes irreversible changes of a-C thin layer which can be registered by both the AFM and the DIC microscopy (en)
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Title
| - Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold
- Poškození amorfního uhlíku zářením XUV laseru (46,9 nm) mnoha pulzy pod prahem poškození jedním impulzem (cs)
- Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold (en)
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skos:prefLabel
| - Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold
- Poškození amorfního uhlíku zářením XUV laseru (46,9 nm) mnoha pulzy pod prahem poškození jedním impulzem (cs)
- Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold (en)
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skos:notation
| - RIV/68378271:_____/07:00086335!RIV08-AV0-68378271
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(1P04LA235), P(IAA400100701), P(KAN300100702), P(LC510), P(LC528), Z(AV0Z10100523)
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/07:00086335
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - radiation damage; amorphous carbon; XUV radiation; capillary-discharge laser (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Damage to VUV, EUV, and X-ray Optics
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Chalupský, Jaromír
- Hájková, Věra
- Juha, Libor
- Störmer, M.
- Vorlíček, Vladimír
- Reale, A.
- Ritucci, A.
- Zuppella, P.
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http://linked.open...vavai/riv/typAkce
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http://linked.open.../riv/zahajeniAkce
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http://linked.open...n/vavai/riv/zamer
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number of pages
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http://purl.org/ne...btex#hasPublisher
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https://schema.org/isbn
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