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rdf:type
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Description
| - Structure of thin films usually requires to be examined on microscopic level. The research topics like growth and stability of thin films, phase transitions and separation, crystallization, diffusion and defect formation has a need for LEED or XPS as techniques adequate for investigation of atomic transport processes on short length scales. The low energy electron microscopy is a complementary solution for imaging of samples with special concern for knowledge of surface physics and material science. In this contribution the microscopic examination of as-deposited and thermal treated thin films on Si substrates is performed.
- Structure of thin films usually requires to be examined on microscopic level. The research topics like growth and stability of thin films, phase transitions and separation, crystallization, diffusion and defect formation has a need for LEED or XPS as techniques adequate for investigation of atomic transport processes on short length scales. The low energy electron microscopy is a complementary solution for imaging of samples with special concern for knowledge of surface physics and material science. In this contribution the microscopic examination of as-deposited and thermal treated thin films on Si substrates is performed. (en)
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Title
| - Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope
- Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope (en)
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skos:prefLabel
| - Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope
- Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope (en)
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skos:notation
| - RIV/68081731:_____/10:00350672!RIV11-AV0-68081731
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(IAA100650803), Z(AV0Z20650511)
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68081731:_____/10:00350672
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - thin films; SLEEM; Si substrate (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Mikmeková, Šárka
- Frank, Luděk
- Polčák, J.
- Zobačová, Jitka
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http://linked.open...vavai/riv/typAkce
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http://linked.open.../riv/zahajeniAkce
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http://linked.open...n/vavai/riv/zamer
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number of pages
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http://purl.org/ne...btex#hasPublisher
| - Institute of Scientific Instruments AS CR, v.v.i
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https://schema.org/isbn
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