About: Limited volume thin film deposition on geometrically complicated substrates

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrate and the TiOx based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared. This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrate and the TiOx based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared. (en)
Title	Limited volume thin film deposition on geometrically complicated substrates Limited volume thin film deposition on geometrically complicated substrates (en)
skos:prefLabel	Limited volume thin film deposition on geometrically complicated substrates Limited volume thin film deposition on geometrically complicated substrates (en)
skos:notation	RIV/60076658:12410/09:00011372!RIV10-AV0-12410___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(KAN101120701)
http://linked.open...iv/cisloPeriodika	2
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Bartoš, Petr Špatenka, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Jihočeská univerzita v Českých Budějovicích / Pedagogická fakulta
http://linked.open...dnocenehoVysledku	323795
http://linked.open...ai/riv/idVysledku	RIV/60076658:12410/09:00011372
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma deposition; computer simulations; geometrically complicated substrates (en)
http://linked.open.../riv/klicoveSlovo	computer simulations plasma deposition geometrically complicated substrates
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[6CD833E30536]
http://linked.open...i/riv/nazevZdroje	European Physical Journal D
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	54
http://linked.open...iv/tvurceVysledku	Bartoš, Petr Špatenka, Petr Volfová, L.
http://linked.open...ain/vavai/riv/wos	000268329200007
issn	1434-6060
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	12410

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