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Description
| - Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces (average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 °C. Annealing of the as-deposited films in He to 1400 °C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm).
- Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces (average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 °C. Annealing of the as-deposited films in He to 1400 °C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm). (en)
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Title
| - Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency
- Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency (en)
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skos:prefLabel
| - Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency
- Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency (en)
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skos:notation
| - RIV/49777513:23520/13:43918474!RIV14-GA0-23520___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/13:43918474
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Defect-free surfaces; High optical transparency; High thermal stability; Pulsed magnetron sputtering; Si-B-C-N films (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Surface & Coatings Technology
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Houška, Jiří
- Zeman, Petr
- Vlček, Jaroslav
- Calta, Pavel
- Čerstvý, Radomír
- Steidl, Petr
- Kohout, Jiří
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1016/j.surfcoat.2013.03.033
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http://localhost/t...ganizacniJednotka
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