About: Effect of the target power density on high power impulse magnetron sputtering of copper     Goto   Sponge   Distinct   Permalink

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  • We present a model analysis of a high power impulse magnetron sputtering of copper. We use a non-stationary global model based on the particle and energy conservation equations in two zones, which makes it possible to calculate time evolutions of the averaged process gas and target material neutral and ion densities, as well as the fluxes of these particles to the target and substrate during a pulse period. We study the effect of the increasing target power density under conditions corresponding to a real experimental system. The calculated target current waveforms show a long steady state and are in a good agreement with the experimental results. For an increasing target power density, an analysis of the particle densities shows a gradual transition to a metal dominated discharge plasma with an increasing degree of ionization of the depositing flux.
  • We present a model analysis of a high power impulse magnetron sputtering of copper. We use a non-stationary global model based on the particle and energy conservation equations in two zones, which makes it possible to calculate time evolutions of the averaged process gas and target material neutral and ion densities, as well as the fluxes of these particles to the target and substrate during a pulse period. We study the effect of the increasing target power density under conditions corresponding to a real experimental system. The calculated target current waveforms show a long steady state and are in a good agreement with the experimental results. For an increasing target power density, an analysis of the particle densities shows a gradual transition to a metal dominated discharge plasma with an increasing degree of ionization of the depositing flux. (en)
Title
  • Effect of the target power density on high power impulse magnetron sputtering of copper
  • Effect of the target power density on high power impulse magnetron sputtering of copper (en)
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  • Effect of the target power density on high power impulse magnetron sputtering of copper
  • Effect of the target power density on high power impulse magnetron sputtering of copper (en)
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  • RIV/49777513:23520/12:43914807!RIV13-MSM-23520___
http://linked.open...avai/riv/aktivita
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  • P(OC10045), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 2
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  • 133334
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  • RIV/49777513:23520/12:43914807
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  • Non-stationary model; HiPIMS; Pulsed sputtering; High-power magnetron sputtering (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
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  • [3220337A09A0]
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  • PLASMA SOURCES SCIENCE & TECHNOLOGY
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  • 21
http://linked.open...iv/tvurceVysledku
  • Kozák, Tomáš
http://linked.open...ain/vavai/riv/wos
  • 000302779400026
http://linked.open...n/vavai/riv/zamer
issn
  • 0963-0252
number of pages
http://bibframe.org/vocab/doi
  • 10.1088/0963-0252/21/2/025012
http://localhost/t...ganizacniJednotka
  • 23520
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