About: Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films     Goto   Sponge   Distinct   Permalink

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Description
  • Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO2 films. Both magnetrons operated in the asymmetric bipolar mode at the repetition frequency of 100 kHz. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high-energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.
  • Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO2 films. Both magnetrons operated in the asymmetric bipolar mode at the repetition frequency of 100 kHz. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high-energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films. (en)
Title
  • Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films
  • Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films (en)
skos:prefLabel
  • Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films
  • Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films (en)
skos:notation
  • RIV/49777513:23520/11:43898421!RIV12-MSM-23520___
http://linked.open...avai/riv/aktivita
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  • P(OC10045), Z(MSM4977751302)
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  • 3
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  • 205788
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  • RIV/49777513:23520/11:43898421
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  • TiO2 films; pulsed dual magnetron sputtering; photocatalysis; mass spectroscopy; ion energy distribution function (en)
http://linked.open.../riv/klicoveSlovo
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  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [C10FD2C4A3CB]
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  • Plasma Processes and Polymers
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  • 8
http://linked.open...iv/tvurceVysledku
  • Novák, Ondřej
  • Vlček, Jaroslav
  • Šícha, Jan
  • Kudláček, Pavel
http://linked.open...ain/vavai/riv/wos
  • 000289024800002
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
http://bibframe.org/vocab/doi
  • 10.1002/ppap.201000131
http://localhost/t...ganizacniJednotka
  • 23520
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